SF

Sanae Furuya

TC Tokyo Ohka Kogyo Co.: 10 patents #121 of 684Top 20%
RI Riken: 1 patents #679 of 1,824Top 40%
Overall (All Time): #515,125 of 4,157,543Top 15%
10
Patents All Time

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
8742038 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound Daiju Shiono, Takahiro Dazai, Tomoyuki Hirano, Takayoshi Mori 2014-06-03
8642244 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound Daiju Shiono, Takahiro Dazai, Tomoyuki Hirano, Takayoshi Mori 2014-02-04
8475997 Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound Daiju Shiono, Tomoyuki Hirano, Takahiro Dazai, Hiroaki Shimizu, Tsuyoshi Kurosawa +2 more 2013-07-02
8298745 Polymeric compound, positive resist composition, and method of forming resist pattern Takahiro Dazai, Shinichi Kohno 2012-10-30
8221956 Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound Daiju Shiono, Tomoyuki Hirano, Takahiro Dazai, Hiroaki Shimizu, Tsuyoshi Kurosawa +2 more 2012-07-17
8088553 Positive resist composition, method of forming resist pattern, and polymeric compound Hiroaki Shimizu, Tsuyoshi Nakamura, Takayoshi Mori, Daiju Shiono, Tomoyuki Hirano +1 more 2012-01-03
8025923 Method for manufacturing a structure Shigenori Fujikawa, Toyoki Kunitake, Hiromi Takaemoto, Mari Koizumi, Hideo Hada 2011-09-27
7989138 Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern Takahiro Dazai, Takayoshi Mori, Ryoichi Takasu, Tomoyuki Hirano 2011-08-02
7914967 Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern Takayoshi Mori, Takahiro Dazai, Ryoichi Takasu, Tomoyuki Hirano 2011-03-29
7741008 Positive resist composition, positive resist composition for thermal flow, and resist pattern forming method Hideo Hada, Yusuke Nakagawa, Akiyoshi Yamazaki 2010-06-22