Issued Patents All Time
Showing 1–25 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9040220 | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern | Yoshiyuki Utsumi, Keita Ishiduka, Kensuke Matsuzawa, Fumitake Kaneko, Kyoko Ohshita +2 more | 2015-05-26 |
| 9034556 | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern | Yoshiyuki Utsumi, Keita Ishiduka, Kensuke Matsuzawa, Fumitake Kaneko, Kyoko Ohshita +2 more | 2015-05-19 |
| 9012129 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Yoshiyuki Utsumi, Takehiro Seshimo, Akiya Kawaue | 2015-04-21 |
| 8808959 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Yoshiyuki Utsumi, Takehiro Seshimo, Akiya Kawaue | 2014-08-19 |
| 8741538 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | Toshiyuki Ogata, Syogo Matsumaru, Masaaki Yoshida | 2014-06-03 |
| 8415085 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Yoshiyuki Utsumi, Takehiro Seshimo, Akiya Kawaue | 2013-04-09 |
| 8389197 | Compound, positive resist composition and resist pattern forming method | Takako Hirosaki, Daiju Shiono, Taku Hirayama | 2013-03-05 |
| 8367299 | Resist composition, method of forming resist pattern, compound and acid generator | Akiya Kawaue, Yoshiyuki Utsumi, Takehiro Seshimo, Tsuyoshi Nakamura, Naoto Motoike +2 more | 2013-02-05 |
| 8338076 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Akiya Kawaue, Yoshiyuki Utsumi, Takehiro Seshimo, Kensuke Matsuzawa, Keita Ishiduka +1 more | 2012-12-25 |
| 8304163 | Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern | Daiju Shiono, Taku Hirayama, Toshiyuki Ogata, Shogo Matsumaru | 2012-11-06 |
| 8293449 | Positive resist composition and method of forming resist pattern | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura | 2012-10-23 |
| 8257903 | Compound, positive resist composition and method for formation of resist pattern | Daiju Shiono | 2012-09-04 |
| 8227169 | Compound, acid generator, resist composition, and method of forming resist pattern | Akiya Kawaue, Yoshiyuki Utsumi, Takehito Seo, Kotaro Endo, Daisuke Kawana +2 more | 2012-07-24 |
| 8206890 | Resist composition, method of forming resist pattern, compound and acid generator | Akiya Kawaue, Yoshiyuki Utsumi, Takehiro Seshimo, Tsuyoshi Nakamura, Naoto Motoike +2 more | 2012-06-26 |
| 8198004 | Resist composition | Taku Hirayama, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato, Ryoichi Takasu +6 more | 2012-06-12 |
| 8187789 | Positive resist composition and method of forming resist pattern | Koji Yonemura, Makiko Irie | 2012-05-29 |
| 8124313 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Takehiro Seshimo, Yoshiyuki Utsumi, Akiya Kawaue, Hiroaki Shimizu, Tsuyoshi Nakamura | 2012-02-28 |
| 8101013 | Film-forming material and method of forming pattern | Shogo Matsumaru, Shingenori Fujikawa, Toyoki Kunitake | 2012-01-24 |
| 8097397 | Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film | Toshikazu Takayama, Keita Ishiduka, Shigeru Yokoi | 2012-01-17 |
| 8025923 | Method for manufacturing a structure | Shigenori Fujikawa, Toyoki Kunitake, Hiromi Takaemoto, Mari Koizumi, Sanae Furuya | 2011-09-27 |
| 8017300 | Compound, positive resist composition and method for forming resist pattern | Daiju Shiono, Taku Hirayama | 2011-09-13 |
| 8012669 | Resist composition and method of forming resist pattern | Hiroaki Shimizu, Yasuhiro Yoshii, Yoshiyuki Utumi | 2011-09-06 |
| 7993706 | Method of forming a nano-structure and the nano-structure | Shigenori Fujikawa, Toyoki Kunitake, Toshiyuki Ogata | 2011-08-09 |
| 7960089 | Compound, method for producing same, positive resist composition and method for forming resist pattern | Daiju Shiono, Takahiro Dazai, Taku Hirayama, Kohei KASAI | 2011-06-14 |
| 7943284 | Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern | Daiju Shiono, Taku Hirayama, Toshiyuki Ogata, Shogo Matsumaru | 2011-05-17 |