Issued Patents All Time
Showing 51–75 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7592122 | Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist composition | Toshiyuki Ogata, Kotaro Endo, Hiromitsu Tsuji, Masaaki Yoshida, Mitsuru Sato +1 more | 2009-09-22 |
| 7544460 | Resist composition, multilayer body, and method for forming resist pattern | Kazuhito Sasaki, Satoshi Fujimura, Takeshi Iwai | 2009-06-09 |
| 7541138 | Resist composition | Taku Hirayama, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato, Ryoichi Takasu +6 more | 2009-06-02 |
| 7527909 | Resist composition | Taku Hirayama, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato, Ryoichi Takasu +6 more | 2009-05-05 |
| 7504196 | Positive resist composition, method for resist pattern formation and compound | Daju Shiono, Taku Hirayama | 2009-03-17 |
| 7501220 | Resist composition | Taku Hirayama, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato, Ryoichi Takasu +6 more | 2009-03-10 |
| 7501221 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi | 2009-03-10 |
| 7494759 | Positive resist compositions and process for the formation of resist patterns with the same | Masaru Takeshita, Satoshi Yamada | 2009-02-24 |
| 7488568 | Resist composition, method of forming resist pattern, compound and acid generator | Takeshi Iwai, Masaru Takeshita, Akiya Kawaue, Keita Ishiduka, Hiroaki Shimizu +6 more | 2009-02-10 |
| 7482108 | Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns | Shogo Matsumaru, Masaru Takeshita, Takeshi Iwai | 2009-01-27 |
| 7435530 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi | 2008-10-14 |
| 7407734 | Resist composition for electron beam or EUV | Takeo Watanabe, Hiroo Kinoshita | 2008-08-05 |
| 7390612 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi | 2008-06-24 |
| 7326512 | Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound | Toshiyuki Ogata, Kotaro Endo, Hiromitsu Tsuji, Masaaki Yoshida, Ryoichi Takasu +1 more | 2008-02-05 |
| 7326515 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi | 2008-02-05 |
| 7323287 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi | 2008-01-29 |
| 7316885 | Method of forming resist pattern, positive resist composition, and layered product | Miwa Miyairi, Naotaka Kubota, Takeshi Iwai | 2008-01-08 |
| 7316889 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi | 2008-01-08 |
| 7316888 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi | 2008-01-08 |
| 7312015 | Process for refining crude resin for electronic material | Takeshi Iwai, Masaru Takeshita, Ryotaro Hayashi, Masaaki Muroi, Kota Atsuchi +2 more | 2007-12-25 |
| 7276575 | Process for refining crude resin for resist | Takeshi Iwai, Miwa Miyairi, Masaaki Muroi, Kota Atsuchi, Hiroaki Tomida | 2007-10-02 |
| 7183368 | Negative-working photoresist composition | Takeshi Iwai, Satoshi Fujimura | 2007-02-27 |
| 7074543 | Positive resist composition and method of forming resist pattern from the same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi | 2006-07-11 |
| 6982140 | Positive resist composition and method of forming resist pattern | Satoshi Fujimura, Jun Iwashita | 2006-01-03 |
| 6897012 | Negative-working photoresist composition | Takeshi Iwai, Satoshi Fujimura | 2005-05-24 |