Issued Patents All Time
Showing 76–94 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6759176 | Positive-working resist composition | Takeshi Iwai, Satoshi Fujimura | 2004-07-06 |
| 6749989 | Positive-working photoresist composition | Satoshi Fujimura, Kazuhito Sasaki, Takeshi Iwai | 2004-06-15 |
| 6749991 | Negative-working photoresist composition | Takeshi Iwai, Satoshi Fujimura | 2004-06-15 |
| 6444397 | Negative-working photoresist composition | Takeshi Iwai, Satoshi Fujimura | 2002-09-03 |
| 6388101 | Chemical-sensitization photoresist composition | Kazufumi Sato, Hiroshi Komano | 2002-05-14 |
| 6245930 | Chemical-sensitization resist composition | Katsumi Oomori, Fumitake Kaneko, Mitsuru Sato, Kazufumi Sato, Toshimasa Nakayama | 2001-06-12 |
| 6225476 | Positive-working photoresist composition | Kazufumi Sato, Hiroshi Komano | 2001-05-01 |
| 6087063 | Positive-working photoresist composition | Kazufumi Sato, Hiroshi Komano | 2000-07-11 |
| 6077644 | Positive-working resist composition | Kazufumi Sato, Hiroshi Komano, Toshimasa Nakayama | 2000-06-20 |
| 6063953 | Chemical-sensitization photoresist composition | Hiroyuki Yamazaki, Yoshiki Sugeta, Hiroshi Komano | 2000-05-16 |
| 6022666 | Chemical-sensitization photoresist composition | Hiroyuki Yamazaki, Yoshiki Sugeta, Hiroshi Komano | 2000-02-08 |
| 5990338 | Negative-working chemical-sensitization photoresist composition | Yoshiki Sugeta, Hiroyuki Yamazaki, Hiroshi Komano | 1999-11-23 |
| 5976760 | Chemical-sensitization resist composition | Katsumi Oomori, Fumitake Kaneko, Mitsuru Sato, Kazufumi Sato, Toshimasa Nakayama | 1999-11-02 |
| 5973187 | Positive-working chemical-sensitization photoresist composition | Yoshiki Sugeta, Hiroyuki Yamazaki, Hiroshi Komano | 1999-10-26 |
| 5929271 | Compounds for use in a positive-working resist composition | Kazufumi Sato, Hiroshi Komano, Toshimasa Nakayama | 1999-07-27 |
| 5902713 | Chemical-sensitization photoresist composition | Hiroyuki Yamazaki, Yoshiki Sugeta, Hiroshi Komano, Kiyoshi Ishikawa | 1999-05-11 |
| 5892095 | Cyano group-containing oxime sulfonate compounds | Hiroshi Komano, Toshimasa Nakayama | 1999-04-06 |
| 5800964 | Photoresist composition | Mitsuru Sato, Kazuyuki Nitta, Tatsuya Hashiguchi, Hiroshi Komano, Toshimasa Nakayama | 1998-09-01 |
| 5714625 | Cyanooxime sulfonate compound | Tatsuya Hashiguchi, Hiroshi Komano, Toshimasa Nakayama | 1998-02-03 |