Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8187798 | Method of forming fine patterns | Fumitake Kaneko, Toshikazu Tachikawa | 2012-05-29 |
| 8142980 | Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent | Fumitake Kaneko, Toshikazu Tachikawa, Naohisa Ueno | 2012-03-27 |
| 8124318 | Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent | Fumitake Kaneko, Toshikazu Tachikawa | 2012-02-28 |
| 8043798 | Method of forming fine patterns | Tsuyoshi Nakamura, Tasuku Matsumiya, Kiyoshi Ishikawa, Toshikazu Tachikawa | 2011-10-25 |
| 7579138 | Method for forming micropattern | Naohisa Ueno | 2009-08-25 |
| 7553610 | Method of forming fine patterns | Fumitake Kaneko, Toshikazu Tachikawa | 2009-06-30 |
| 7235345 | Agent for forming coating for narrowing patterns and method for forming fine pattern using the same | Fumitake Kaneko, Toshikazu Tachikawa | 2007-06-26 |
| 7189499 | Method of forming fine patterns | Fumitake Kaneko, Toshikazu Tachikawa | 2007-03-13 |
| 6811817 | Method for reducing pattern dimension in photoresist layer | Fumitake Kaneko, Toshikazu Tachikawa | 2004-11-02 |
| 6399275 | Negative-working photolithographic patterning material and method for the preparation of ion-implanted and metal-plated substrates by using the same | Kimitaka Morio, Takayuki Haraguchi | 2002-06-04 |
| 6063953 | Chemical-sensitization photoresist composition | Hideo Hada, Hiroyuki Yamazaki, Hiroshi Komano | 2000-05-16 |
| 6042988 | Chemical-amplification-type negative resist composition | Mitsuro Sato, Katsumi Oomori, Etsuko Iguchi, Kiyoshi Ishikawa, Fumitake Kaneko | 2000-03-28 |
| 6022666 | Chemical-sensitization photoresist composition | Hideo Hada, Hiroyuki Yamazaki, Hiroshi Komano | 2000-02-08 |
| 5990338 | Negative-working chemical-sensitization photoresist composition | Hideo Hada, Hiroyuki Yamazaki, Hiroshi Komano | 1999-11-23 |
| 5973187 | Positive-working chemical-sensitization photoresist composition | Hideo Hada, Hiroyuki Yamazaki, Hiroshi Komano | 1999-10-26 |
| 5955241 | Chemical-amplification-type negative resist composition and method for forming negative resist pattern | Mitsuru Sato, Kiyoshi Ishikawa, Hiroyuki Yamazaki, Toshimasa Nakayama | 1999-09-21 |
| 5928837 | Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds | Mitsuru Sato, Kiyoshi Ishikawa, Hiroyuki Yamazaki, Toshikazu Tachikawa, Hiroshi Komano | 1999-07-27 |
| 5902713 | Chemical-sensitization photoresist composition | Hideo Hada, Hiroyuki Yamazaki, Hiroshi Komano, Kiyoshi Ishikawa | 1999-05-11 |