Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8198004 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato +6 more | 2012-06-12 |
| 8187798 | Method of forming fine patterns | Yoshiki Sugeta, Fumitake Kaneko | 2012-05-29 |
| 8142980 | Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent | Yoshiki Sugeta, Fumitake Kaneko, Naohisa Ueno | 2012-03-27 |
| 8124318 | Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent | Yoshiki Sugeta, Fumitake Kaneko | 2012-02-28 |
| 8043798 | Method of forming fine patterns | Tsuyoshi Nakamura, Tasuku Matsumiya, Kiyoshi Ishikawa, Yoshiki Sugeta | 2011-10-25 |
| 7553610 | Method of forming fine patterns | Fumitake Kaneko, Yoshiki Sugeta | 2009-06-30 |
| 7541138 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato +6 more | 2009-06-02 |
| 7527909 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato +6 more | 2009-05-05 |
| 7501220 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato +6 more | 2009-03-10 |
| 7235345 | Agent for forming coating for narrowing patterns and method for forming fine pattern using the same | Yoshiki Sugeta, Fumitake Kaneko | 2007-06-26 |
| 7189499 | Method of forming fine patterns | Yoshiki Sugeta, Fumitake Kaneko | 2007-03-13 |
| 7033731 | Multilayered body for photolithographic patterning | Fumitake Kaneko, Naotaka Kubota, Miwa Miyairi, Takako Hirosaki, Koutaro Endo | 2006-04-25 |
| 6936400 | Negative resist composition | Ryoichi Takasu, Miwa Miyairi, Jun Iwashita | 2005-08-30 |
| 6864036 | Negative-working photoresist composition | Fumitake Kaneko, Naotaka Kubota, Miwa Miyairi, Takako Hirosaki, Koutaro Endo | 2005-03-08 |
| 6811817 | Method for reducing pattern dimension in photoresist layer | Yoshiki Sugeta, Fumitake Kaneko | 2004-11-02 |
| 6544712 | Negative working resist composition | Fumitake Kaneko, Miwa Miyairi, Masakazu Kobayashi | 2003-04-08 |
| 6455228 | Multilayered body for photolithographic patterning | Fumitake Kaneko, Naotaka Kubota, Miwa Miyairi, Takako Hirosaki, Koutaro Endo | 2002-09-24 |
| 6406829 | Negative-working photoresist composition | Fumitake Kaneko, Naotaka Kubota, Miwa Miyairi, Takako Hirosaki, Koutaro Endo | 2002-06-18 |
| 6276861 | Writing instrument | — | 2001-08-21 |
| 6171749 | Negative-working chemical-amplification photoresist composition | Fumitake Kaneko, Satoshi Fujimura, Miwa Miyairi, Hiroshi Komano, Toshimasa Nakayama | 2001-01-09 |
| 5928837 | Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds | Mitsuru Sato, Kiyoshi Ishikawa, Yoshiki Sugeta, Hiroyuki Yamazaki, Hiroshi Komano | 1999-07-27 |