Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8198004 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato +6 more | 2012-06-12 |
| 7989138 | Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern | Sanae Furuya, Takahiro Dazai, Takayoshi Mori, Tomoyuki Hirano | 2011-08-02 |
| 7914967 | Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern | Sanae Furuya, Takayoshi Mori, Takahiro Dazai, Tomoyuki Hirano | 2011-03-29 |
| 7914968 | Positive resist composition and method of forming resist pattern | Takeyoshi Mimura, Akiya Kawaue | 2011-03-29 |
| 7541138 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato +6 more | 2009-06-02 |
| 7527909 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato +6 more | 2009-05-05 |
| 7501220 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato +6 more | 2009-03-10 |
| 7371510 | Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern | Taku Hirayama, Mitsuru Sato, Kazumasa Wakiya, Masaaki Yoshida, Koki Tamura | 2008-05-13 |
| 7326512 | Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound | Toshiyuki Ogata, Kotaro Endo, Hiromitsu Tsuji, Masaaki Yoshida, Hideo Hada +1 more | 2008-02-05 |
| 6936400 | Negative resist composition | Miwa Miyairi, Jun Iwashita, Toshikazu Tachikawa | 2005-08-30 |