Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7501221 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Hideo Hada | 2009-03-10 |
| 7435530 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Hideo Hada | 2008-10-14 |
| 7390612 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Hideo Hada | 2008-06-24 |
| 7326515 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Hideo Hada | 2008-02-05 |
| 7323287 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Hideo Hada | 2008-01-29 |
| 7316888 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Hideo Hada | 2008-01-08 |
| 7316889 | Positive type resist composition and resist pattern formation method using same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Hideo Hada | 2008-01-08 |
| 7316885 | Method of forming resist pattern, positive resist composition, and layered product | Hideo Hada, Naotaka Kubota, Takeshi Iwai | 2008-01-08 |
| 7276575 | Process for refining crude resin for resist | Hideo Hada, Takeshi Iwai, Masaaki Muroi, Kota Atsuchi, Hiroaki Tomida | 2007-10-02 |
| 7074543 | Positive resist composition and method of forming resist pattern from the same | Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Hideo Hada | 2006-07-11 |
| 7033731 | Multilayered body for photolithographic patterning | Toshikazu Tachikawa, Fumitake Kaneko, Naotaka Kubota, Takako Hirosaki, Koutaro Endo | 2006-04-25 |
| 6936400 | Negative resist composition | Ryoichi Takasu, Jun Iwashita, Toshikazu Tachikawa | 2005-08-30 |
| 6864036 | Negative-working photoresist composition | Toshikazu Tachikawa, Fumitake Kaneko, Naotaka Kubota, Takako Hirosaki, Koutaro Endo | 2005-03-08 |
| 6544712 | Negative working resist composition | Toshikazu Tachikawa, Fumitake Kaneko, Masakazu Kobayashi | 2003-04-08 |
| 6455228 | Multilayered body for photolithographic patterning | Toshikazu Tachikawa, Fumitake Kaneko, Naotaka Kubota, Takako Hirosaki, Koutaro Endo | 2002-09-24 |
| 6406829 | Negative-working photoresist composition | Toshikazu Tachikawa, Fumitake Kaneko, Naotaka Kubota, Takako Hirosaki, Koutaro Endo | 2002-06-18 |
| 6171749 | Negative-working chemical-amplification photoresist composition | Toshikazu Tachikawa, Fumitake Kaneko, Satoshi Fujimura, Hiroshi Komano, Toshimasa Nakayama | 2001-01-09 |