Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7972762 | Positive resist composition and method of forming resist pattern | Masaaki Muroi, Takahiro Nakamura, Masakazu Yamada, Kensuke Saisyo, Masaru Takeshita +2 more | 2011-07-05 |
| 7879527 | Method of producing positive resist composition, positive resist composition, and method of forming resist pattern | Masaaki Muroi, Takahiro Nakamura, Masakazu Yamada, Kensuke Saisyo | 2011-02-01 |
| 7771911 | Process for producing photoresist composition, filter, coater and photoresist composition | Hideo Hada, Takeshi Iwai, Masaaki Shimazaki, Masaaki Muroi, Hiroaki Tomida +1 more | 2010-08-10 |
| 7695889 | Copolymer for semiconductor lithography and process for production thereof | Takanori Yamagishi, Tomo Oikawa, Masaaki Muroi, Takahiro Nakamura, Masakazu Yamada +2 more | 2010-04-13 |
| 7312015 | Process for refining crude resin for electronic material | Hideo Hada, Takeshi Iwai, Masaru Takeshita, Ryotaro Hayashi, Masaaki Muroi +2 more | 2007-12-25 |
| 7276575 | Process for refining crude resin for resist | Hideo Hada, Takeshi Iwai, Miwa Miyairi, Masaaki Muroi, Hiroaki Tomida | 2007-10-02 |