Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9023982 | Method for purifying resin for photolithography | — | 2015-05-05 |
| 8859180 | Copolymer and composition for semiconductor lithography and process for producing the copolymer | Takayoshi Okada, Masaaki Kudo, Takanori Yamagishi | 2014-10-14 |
| 8759462 | Method for producing resist copolymer having low molecular weight | — | 2014-06-24 |
| 8455596 | Method for producing a copolymer for photoresist | Eiichi Ikawa | 2013-06-04 |
| 8211615 | Copolymer for immersion lithography and compositions | Takanori Yamagishi, Takayoshi Okada | 2012-07-03 |
| 8163852 | Resist polymer and method for producing the polymer | Takanori Yamagishi, Ichiro Kato, Kazuhiko Mizuno, Satoshi Yamaguchi | 2012-04-24 |
| 7972762 | Positive resist composition and method of forming resist pattern | Masaaki Muroi, Kota Atsuchi, Takahiro Nakamura, Masakazu Yamada, Kensuke Saisyo +2 more | 2011-07-05 |
| 7695889 | Copolymer for semiconductor lithography and process for production thereof | Takanori Yamagishi, Masaaki Muroi, Kota Atsuchi, Takahiro Nakamura, Masakazu Yamada +2 more | 2010-04-13 |
| 7045582 | Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process | Takanori Yamagishi, Kazuhiko Mizuno, Ichiro Kato | 2006-05-16 |
| 5945544 | Process for production of N-vinyllactam | Hideki Ohmori, Toshiyuki Fukudome, Tomonori Hakozaki, Satoshi Kakuta, Hidenobu Oda | 1999-08-31 |