Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8455182 | Composition for antireflection film formation and method for resist pattern formation using the composition | Atsushi Sawano, Jun Koshiyama | 2013-06-04 |
| 8389197 | Compound, positive resist composition and resist pattern forming method | Daiju Shiono, Taku Hirayama, Hideo Hada | 2013-03-05 |
| 8216775 | Anti-reflection film forming material, and method for forming resist pattern using the same | Yuriko Shirai, Masahiro Masujima, Atsushi Sawano, Jun Koshiyama | 2012-07-10 |
| 8206887 | Positive resist composition and resist pattern forming method | Daiju Shiono, Taku Hirayama | 2012-06-26 |
| 8158328 | Composition for formation of anti-reflection film, and method for formation of resist pattern using the same | Atsushi Sawano, Jun Koshiyama | 2012-04-17 |
| 8062825 | Positive resist composition and resist pattern forming method | Tomoyuki Ando | 2011-11-22 |
| 7981588 | Negative resist composition and method of forming resist pattern | Taku Hirayama, Daiju Shiono | 2011-07-19 |
| 7871753 | Positive resist composition and method of forming resist pattern | Tasuku Matsumiya | 2011-01-18 |
| 7033731 | Multilayered body for photolithographic patterning | Toshikazu Tachikawa, Fumitake Kaneko, Naotaka Kubota, Miwa Miyairi, Koutaro Endo | 2006-04-25 |
| 6864036 | Negative-working photoresist composition | Toshikazu Tachikawa, Fumitake Kaneko, Naotaka Kubota, Miwa Miyairi, Koutaro Endo | 2005-03-08 |
| 6544717 | Undercoating composition for photolithographic resist | Etsuko Iguchi, Masakazu Kobayashi | 2003-04-08 |
| 6455228 | Multilayered body for photolithographic patterning | Toshikazu Tachikawa, Fumitake Kaneko, Naotaka Kubota, Miwa Miyairi, Koutaro Endo | 2002-09-24 |
| 6406829 | Negative-working photoresist composition | Toshikazu Tachikawa, Fumitake Kaneko, Naotaka Kubota, Miwa Miyairi, Koutaro Endo | 2002-06-18 |
| 6297174 | Method for the formation of a planarizing coating film on substrate surface | Etsuko Iguchi, Masakazu Kobayashi | 2001-10-02 |
| 6284428 | Undercoating composition for photolithographic resist | Etsuko Iguchi, Masakazu Kobayashi | 2001-09-04 |