MM

Masahiro Masujima

TC Tokyo Ohka Kogyo Co.: 5 patents #208 of 684Top 35%
SA San-Apro: 1 patents #14 of 35Top 40%
Overall (All Time): #919,944 of 4,157,543Top 25%
5
Patents All Time

Issued Patents All Time

Showing 1–5 of 5 patents

Patent #TitleCo-InventorsDate
12422747 Negative photosensitive resin composition, pattern formation method, and laminated film Takuto Nakao, Tomoyuki SHIBAGAKI, Yuji Nakamura, Kenichi YAMAGATA, Takahiro Kondo +1 more 2025-09-23
8216775 Anti-reflection film forming material, and method for forming resist pattern using the same Yuriko Shirai, Takako Hirosaki, Atsushi Sawano, Jun Koshiyama 2012-07-10
8133653 Positive resist composition for forming thick-film resist, thick-film resist laminate, and method of forming resist pattern Hiroshi Shimbori, Toshihiro Yamaguchi, Sachiko Yoshizawa 2012-03-13
7358028 Chemically amplified positive photo resist composition and method for forming resist pattern Kenji Maruyama, Masaki Kurihara, Ken Miyagi, Satoshi Niikura, Satoshi Shimatani +3 more 2008-04-15
7329478 Chemical amplified positive photo resist composition and method for forming resist pattern Yusuke Nakagawa, Shinichi Hidesaka, Kenji Maruyama, Satoshi Shimatani, Kazuyuki Nitta 2008-02-12