Issued Patents All Time
Showing 1–25 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7419769 | Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same | Koji Saito, Kouichi Misumi, Toshiki Okui | 2008-09-02 |
| 7129018 | Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same | Koji Saito, Kouichi Misumi, Toshiki Okui | 2006-10-31 |
| 7063934 | Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same | Koji Saito, Kouichi Misumi, Toshiki Okui | 2006-06-20 |
| 6846949 | Fluorine-containing monomeric ester compound for base resin in photoresist composition | Toshiyuki Ogata, Kotaro Endo | 2005-01-25 |
| 6838229 | Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same | Yasushi Washio, Koji Saito, Toshiki Okui | 2005-01-04 |
| 6787284 | Positive resist composition and base material carrying layer of the positive resist composition | Toshiyuki Ogata, Koutaro Endo | 2004-09-07 |
| 6683202 | Fluorine-containing monomeric ester compound for base resin in photoresist composition | Toshiyuki Ogata, Kotaro Endo | 2004-01-27 |
| 6641972 | Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same | Kouichi Misumi, Koji Saito, Toshiki Okui | 2003-11-04 |
| 6388101 | Chemical-sensitization photoresist composition | Hideo Hada, Kazufumi Sato | 2002-05-14 |
| 6376153 | Photopolymerizable composition for color filter | Kiyoshi Uchikawa, Masaru Shida | 2002-04-23 |
| 6329126 | Developer solution for acitinic ray sensitive resist | Hatsuyuki Tanaka, Mitsuru Sato, Toshimasa Nakayama | 2001-12-11 |
| 6268108 | Composition for forming antireflective coating film and method for forming resist pattern using same | Etsuko Iguchi, Masakazu Kobayashi, Toshimasa Nakayama | 2001-07-31 |
| 6265116 | Process for producing color filter | Kiyoshi Uchikawa, Masaru Shida | 2001-07-24 |
| 6261745 | Post-ashing treating liquid compositions and a process for treatment therewith | Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi, Toshimasa Nakayama | 2001-07-17 |
| 6225476 | Positive-working photoresist composition | Hideo Hada, Kazufumi Sato | 2001-05-01 |
| 6171749 | Negative-working chemical-amplification photoresist composition | Toshikazu Tachikawa, Fumitake Kaneko, Satoshi Fujimura, Miwa Miyairi, Toshimasa Nakayama | 2001-01-09 |
| 6136505 | Liquid coating composition for use in forming antireflective film and photoresist material using said antireflective film | Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi, Toshimasa Nakayama | 2000-10-24 |
| 6087063 | Positive-working photoresist composition | Hideo Hada, Kazufumi Sato | 2000-07-11 |
| 6077644 | Positive-working resist composition | Hideo Hada, Kazufumi Sato, Toshimasa Nakayama | 2000-06-20 |
| 6063953 | Chemical-sensitization photoresist composition | Hideo Hada, Hiroyuki Yamazaki, Yoshiki Sugeta | 2000-05-16 |
| 6022666 | Chemical-sensitization photoresist composition | Hideo Hada, Hiroyuki Yamazaki, Yoshiki Sugeta | 2000-02-08 |
| 6010824 | Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same | Takeshi Iwai, Katsuyuki Ohta, Toshimi Aoyama, Kiyoshi Uchikawa | 2000-01-04 |
| 5990338 | Negative-working chemical-sensitization photoresist composition | Hideo Hada, Yoshiki Sugeta, Hiroyuki Yamazaki | 1999-11-23 |
| 5973187 | Positive-working chemical-sensitization photoresist composition | Hideo Hada, Yoshiki Sugeta, Hiroyuki Yamazaki | 1999-10-26 |
| 5928837 | Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds | Mitsuru Sato, Kiyoshi Ishikawa, Yoshiki Sugeta, Hiroyuki Yamazaki, Toshikazu Tachikawa | 1999-07-27 |