Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12187989 | Cleaning solution for temporary adhesive for substrates, substrate cleaning method, and cleaning method for support or substrate | Michihiro Sugo, Shohei Tagami | 2025-01-07 |
| 12168759 | Detergent composition, substrate cleaning method, and cleaning method for support or substrate | Michihiro Sugo | 2024-12-17 |
| 11183417 | Method for manufacturing laminate and method for manufacturing substrate | Michihiro Sugo | 2021-11-23 |
| 10950481 | Method for manufacturing thin substrate | Michihiro Sugo | 2021-03-16 |
| 10796939 | Temporary adhesive film roll for substrate processing, method for manufacturing thin wafer | Michihiro Sugo, Kazunori Kondo, Hiroyuki Yasuda | 2020-10-06 |
| 10242902 | Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer | Michihiro Sugo, Hiroyuki Yasuda, Shohei Tagami | 2019-03-26 |
| 10147632 | Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer | Shohei Tagami, Michihiro Sugo, Hiroyuki Yasuda | 2018-12-04 |
| 10128143 | Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer | Michihiro Sugo, Hiroyuki Yasuda, Shohei Tagami, Hideto Kato | 2018-11-13 |
| 9941145 | Wafer processing temporary bonding arrangement, wafer processing laminate, and thin wafer manufacturing method | Michihiro Sugo, Hiroyuki Yasuda | 2018-04-10 |
| 9934996 | Wafer processing bonding arrangement, wafer laminate, and thin wafer manufacturing method | Michihiro Sugo, Hiroyuki Yasuda, Shohei Tagami | 2018-04-03 |
| 9887118 | Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer | Shohei Tagami, Michihiro Sugo, Hideto Kato | 2018-02-06 |
| 9884979 | Temporary adhesion method and method for producing thin wafer | Hiroyuki Yasuda, Michihiro Sugo | 2018-02-06 |
| 9646868 | Wafer temporary bonding method and thin wafer manufacturing method | Hiroyuki Yasuda, Michihiro Sugo, Shohei Tagami | 2017-05-09 |
| 9448468 | Reflective mask blank and reflective mask, and methods for manufacturing reflective mask blank and reflective mask | Norihito Fukugami, Yo Sakata, Tooru Komizo, Takashi Haraguchi | 2016-09-20 |
| 9334424 | Temporary adhesive for wafer processing, member for wafer processing using the same, wafer processed body, and method for producing thin wafer | Michihiro Sugo, Shohei Tagami, Hiroyuki Yasuda, Hideto Kato | 2016-05-10 |
| 9263333 | Wafer processing laminate, wafer processing member, temporary adhering material for processing wafer, and manufacturing method of thin wafer | Michihiro Sugo, Hideto Kato, Shohei Tagami, Hiroyuki Yasuda | 2016-02-16 |
| 6815151 | Rinsing solution for lithography and method for processing substrate with the use of the same | Kazumasa Wakiya, Masakazu Kobayashi, Toshimasa Nakayama | 2004-11-09 |
| 6291142 | Photoresist stripping liquid compositions and a method of stripping photoresists using the same | Kazumasa Wakiya, Masakazu Kobayashi, Toshimasa Nakayama | 2001-09-18 |
| 6261745 | Post-ashing treating liquid compositions and a process for treatment therewith | Kazumasa Wakiya, Masakazu Kobayashi, Hiroshi Komano, Toshimasa Nakayama | 2001-07-17 |
| 6225030 | Post-ashing treating method for substrates | Kazumasa Wakiya, Masakazu Kobayashi, Toshimasa Nakayama | 2001-05-01 |
| 6225034 | Photoresist stripping liquid compositions and a method of stripping photoresists using the same | Kazumasa Wakiya, Masakazu Kobayashi, Toshimasa Nakayama | 2001-05-01 |
| 6218087 | Photoresist stripping liquid composition and a method of stripping photoresists using the same | Kazumasa Wakiya, Masakazu Kobayashi | 2001-04-17 |
| 6136505 | Liquid coating composition for use in forming antireflective film and photoresist material using said antireflective film | Kazumasa Wakiya, Masakazu Kobayashi, Hiroshi Komano, Toshimasa Nakayama | 2000-10-24 |
| 6132928 | Coating solution for forming antireflective coating film | Kazumasa Wakiya, Masakazu Kobayashi, Toshimasa Nakayama | 2000-10-17 |
| 6068000 | Substrate treatment method | Kazumasa Wakiya, Masakazu Kobayashi, Toshimasa Nakayama | 2000-05-30 |