Issued Patents All Time
Showing 26–29 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5968848 | Process for treating a lithographic substrate and a rinse solution for the treatment | Kazumasa Wakiya, Masakazu Kobayashi, Toshimasa Nakayama | 1999-10-19 |
| 5905063 | Remover solution composition for resist and method for removing resist using the same | Kazumasa Wakiya, Masakazu Kobayashi, Toshimasa Nakayama | 1999-05-18 |
| 5795702 | Photoresist stripping liquid compositions and a method of stripping photoresists using the same | Kazumasa Wakiya, Masakazu Kobayashi, Toshimasa Nakayama | 1998-08-18 |
| 5792274 | Remover solution composition for resist and method for removing resist using the same | Kazumasa Wakiya, Masakazu Kobayashi, Toshimasa Nakayama | 1998-08-11 |