Issued Patents All Time
Showing 1–25 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11441101 | Cleaning composition, cleaning method, and method for manufacturing semiconductor | Isao Hirano, Shoichi Terada, Junji Nakamura, Takayuki Toshima | 2022-09-13 |
| 9244358 | Surface treatment liquid, surface treatment method, hydrophobilization method, and hydrophobilized substrate | Jun Koshiyama | 2016-01-26 |
| 8697345 | Photoresist stripping solution and a method of stripping photoresists using the same | Shigeru Yokoi | 2014-04-15 |
| 8685910 | Cleaning liquid used in photolithography and a method for treating substrate therewith | Shigeru Yokoi, Koji Saito | 2014-04-01 |
| 8367312 | Detergent for lithography and method of forming resist pattern with the same | Yoshihiro Sawada, Jun Koshiyama, Hidekazu Tajima, Atsushi Miyamoto, Tomoya Kumagai +1 more | 2013-02-05 |
| 8354215 | Method for stripping photoresist | Shigeru Yokoi, Takayuki Haraguchi | 2013-01-15 |
| 8192923 | Photoresist stripping solution and a method of stripping photoresists using the same | Shigeru Yokoi | 2012-06-05 |
| 8158568 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | Shigeru Yokoi | 2012-04-17 |
| 8124312 | Method for forming pattern, and material for forming coating film | Kiyoshi Ishikawa, Jun Koshiyama | 2012-02-28 |
| 7897325 | Lithographic rinse solution and method for forming patterned resist layer using the same | Yoshihiro Sawada, Jun Koshiyama, Atsushi Miyamoto, Hidekazu Tajima | 2011-03-01 |
| 7846637 | Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film | Keita Ishizuka, Kotaro Endo, Masaaki Yoshida | 2010-12-07 |
| 7811748 | Resist pattern forming method and composite rinse agent | Jun Koshiyama, Fumitake Kaneko, Atsushi Miyamoto, Hidekazu Tajima, Yoshihiro Sawada | 2010-10-12 |
| 7795197 | Cleaning liquid for lithography and method for resist pattern formation | Yoshihiro Sawada, Jun Koshiyama, Atsushi Miyamoto, Hidekazu Tajima | 2010-09-14 |
| 7741260 | Rinsing fluid for lithography | Jun Koshiyama, Fumitake Kaneko, Atsushi Miyamoto, Hidekazu Tajima, Yoshihiro Sawada | 2010-06-22 |
| 7442675 | Cleaning composition and method of cleaning semiconductor substrate | Shigeru Yokoi, Takayuki Haraguchi, Makarem A. Hussein, Lana Jong, Shan Clark | 2008-10-28 |
| 7371510 | Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern | Taku Hirayama, Ryoichi Takasu, Mitsuru Sato, Masaaki Yoshida, Koki Tamura | 2008-05-13 |
| 7238462 | Undercoating material for wiring, embedded material, and wiring formation method | Etsuko Nakamura | 2007-07-03 |
| 7179399 | Material for forming protective film | Jun Koshiyama | 2007-02-20 |
| 7129020 | Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern | Naotaka Kubota, Shigeru Yokoi, Takayuki Haraguchi | 2006-10-31 |
| 6815151 | Rinsing solution for lithography and method for processing substrate with the use of the same | Masahito Tanabe, Masakazu Kobayashi, Toshimasa Nakayama | 2004-11-09 |
| 6746963 | Method for processing coating film and method for manufacturing semiconductor element with use of the same method | Yasushi Fujii, Hiroyuki Iida, Isao Sato, Shigeru Yokoi | 2004-06-08 |
| 6734258 | Protective coating composition for dual damascene process | Etsuko Iguchi, Jun Koshiyama | 2004-05-11 |
| 6689535 | Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern | Etsuko Iguchi, Takeshi Tanaka | 2004-02-10 |
| 6638899 | Photoresist stripping solution and a method of stripping photoresists with the same | Masakazu Kobayashi | 2003-10-28 |
| 6599682 | Method for forming a finely patterned photoresist layer | Etsuko Iguchi | 2003-07-29 |