Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6416930 | Composition for lithographic anti-reflection coating, and resist laminate using the same | Naotaka Kubota, Shigeru Yokoi, Masakazu Kobayashi | 2002-07-09 |
| 6291142 | Photoresist stripping liquid compositions and a method of stripping photoresists using the same | Masahito Tanabe, Masakazu Kobayashi, Toshimasa Nakayama | 2001-09-18 |
| 6261745 | Post-ashing treating liquid compositions and a process for treatment therewith | Masahito Tanabe, Masakazu Kobayashi, Hiroshi Komano, Toshimasa Nakayama | 2001-07-17 |
| 6225034 | Photoresist stripping liquid compositions and a method of stripping photoresists using the same | Masahito Tanabe, Masakazu Kobayashi, Toshimasa Nakayama | 2001-05-01 |
| 6225030 | Post-ashing treating method for substrates | Masahito Tanabe, Masakazu Kobayashi, Toshimasa Nakayama | 2001-05-01 |
| 6218087 | Photoresist stripping liquid composition and a method of stripping photoresists using the same | Masahito Tanabe, Masakazu Kobayashi | 2001-04-17 |
| 6136505 | Liquid coating composition for use in forming antireflective film and photoresist material using said antireflective film | Masahito Tanabe, Masakazu Kobayashi, Hiroshi Komano, Toshimasa Nakayama | 2000-10-24 |
| 6132928 | Coating solution for forming antireflective coating film | Masahito Tanabe, Masakazu Kobayashi, Toshimasa Nakayama | 2000-10-17 |
| 6068000 | Substrate treatment method | Masahito Tanabe, Masakazu Kobayashi, Toshimasa Nakayama | 2000-05-30 |
| 5968848 | Process for treating a lithographic substrate and a rinse solution for the treatment | Masahito Tanabe, Masakazu Kobayashi, Toshimasa Nakayama | 1999-10-19 |
| 5905063 | Remover solution composition for resist and method for removing resist using the same | Masahito Tanabe, Masakazu Kobayashi, Toshimasa Nakayama | 1999-05-18 |
| 5863710 | Developer solution for photolithographic patterning | Masakazu Kobayashi, Toshimasa Nakayama | 1999-01-26 |
| 5795702 | Photoresist stripping liquid compositions and a method of stripping photoresists using the same | Masahito Tanabe, Masakazu Kobayashi, Toshimasa Nakayama | 1998-08-18 |
| 5792274 | Remover solution composition for resist and method for removing resist using the same | Masahito Tanabe, Masakazu Kobayashi, Toshimasa Nakayama | 1998-08-11 |
| 5783362 | Liquid coating composition for use in forming photoresist coating films and a photoresist material using said composition | Masakazu Kobayashi, Toshimasa Nakayama | 1998-07-21 |
| 5631314 | Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition | Masakazu Kobayashi, Toshimasa Nakayama | 1997-05-20 |
| 4944893 | Remover solution for resist | Hatsuyuki Tanaka, Masakazu Kobayashi, Toshimasa Nakayama | 1990-07-31 |