SY

Shigeru Yokoi

TC Tokyo Ohka Kogyo Co.: 14 patents #86 of 684Top 15%
Mitsubishi Electric: 5 patents #5,859 of 25,717Top 25%
IN Intel: 1 patents #18,218 of 30,777Top 60%
Overall (All Time): #223,765 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
9352542 Processing method and processing apparatus Yoshihiro Inao, Atsuo Kajima, Takuma Hasegawa, Koki Tamura 2016-05-31
8859187 Method of forming resist pattern and negative resist composition Ken Tanaka, Sho Abe 2014-10-14
8803026 Laser machining device and bellows device 2014-08-12
8697345 Photoresist stripping solution and a method of stripping photoresists using the same Kazumasa Wakiya 2014-04-15
8685910 Cleaning liquid used in photolithography and a method for treating substrate therewith Kazumasa Wakiya, Koji Saito 2014-04-01
8648279 Process control apparatus and laser processing apparatus Keiji Takahashi, Tomonori Mukae, Tatsuya Yamamoto 2014-02-11
8354215 Method for stripping photoresist Kazumasa Wakiya, Takayuki Haraguchi 2013-01-15
8354365 Cleaning liquid for lithography and method for forming wiring Takuya Ohhashi, Masaru Takahama, Takahiro Eto, Daijiro Mori 2013-01-15
8212176 Machining head, nozzle changer and laser beam machining apparatus Takashi Akiyama, Masahiko Hasegawa, Kazunobu Katase 2012-07-03
8192923 Photoresist stripping solution and a method of stripping photoresists using the same Kazumasa Wakiya 2012-06-05
8158568 Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith Kazumasa Wakiya 2012-04-17
D654518 Laser beam machine Takanori Miyake 2012-02-21
8114825 Photoresist stripping solution Atsushi Yamanouchi 2012-02-14
8097397 Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film Toshikazu Takayama, Keita Ishiduka, Hideo Hada 2012-01-17
7442675 Cleaning composition and method of cleaning semiconductor substrate Kazumasa Wakiya, Takayuki Haraguchi, Makarem A. Hussein, Lana Jong, Shan Clark 2008-10-28
7129020 Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern Kazumasa Wakiya, Naotaka Kubota, Takayuki Haraguchi 2006-10-31
6894248 Laser beam machining apparatus Yoshifumi Arakawa 2005-05-17
6746963 Method for processing coating film and method for manufacturing semiconductor element with use of the same method Yasushi Fujii, Hiroyuki Iida, Isao Sato, Kazumasa Wakiya 2004-06-08
6416930 Composition for lithographic anti-reflection coating, and resist laminate using the same Kazumasa Wakiya, Naotaka Kubota, Masakazu Kobayashi 2002-07-09
5160724 Barium sulfate contrast medium for X-ray examination of the large intestine Yoshito Tonariya, Yukihito Wada, Kazuhiro Yamaguchi, Tomio Yamazaki, Isamu Sakai +2 more 1992-11-03