Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9040220 | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern | Hideo Hada, Yoshiyuki Utsumi, Kensuke Matsuzawa, Fumitake Kaneko, Kyoko Ohshita +2 more | 2015-05-26 |
| 9034556 | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern | Hideo Hada, Yoshiyuki Utsumi, Kensuke Matsuzawa, Fumitake Kaneko, Kyoko Ohshita +2 more | 2015-05-19 |
| 8409781 | Composition for formation of resist protection film, and method for formation of resist pattern using the same | Toshikazu Takayama | 2013-04-02 |
| 8338076 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Akiya Kawaue, Yoshiyuki Utsumi, Hideo Hada, Takehiro Seshimo, Kensuke Matsuzawa +1 more | 2012-12-25 |
| 8329838 | Norbornene-type polymers, compositions thereof and lithographic processes using such compositions | Larry F. Rhodes, Chun Chang, Pramod Kandanarachchi, Lawrence Seger, Kotaro Endo +1 more | 2012-12-11 |
| 8278025 | Material for forming resist protection films and method for resist pattern formation with the same | Kotaro Endo | 2012-10-02 |
| 8252505 | Compound and method of producing same, acid generator, resist composition, and method of forming resist pattern | Akiya Kawaue, Kensuke Matsuzawa, Yoshiyuki Utsumi, Hiroaki Shimizu | 2012-08-28 |
| 8247160 | Resist composition, method of forming resist pattern, and novel compound and acid generator | Yoshiyuki Utsumi, Kensuke Matsuzawa, Akiya Kawaue, Hiroaki Shimizu, Tsuyoshi Nakamura | 2012-08-21 |
| 8211616 | Positive resist composition and method of forming resist pattern | Hiroaki Shimizu, Tsuyoshi Nakamura, Yoshiyuki Utsumi, Kensuke Matsuzawa, Akiya Kawaue | 2012-07-03 |
| 8198004 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato +6 more | 2012-06-12 |
| 8097397 | Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film | Toshikazu Takayama, Hideo Hada, Shigeru Yokoi | 2012-01-17 |
| 7955777 | Compound, acid generator, resist composition and method of forming resist pattern | Takehiro Seshimo, Yoshiyuki Utsumi, Yoshitaka Komuro, Akiya Kawaue, Kyoko Ohshita | 2011-06-07 |
| 7799883 | Norbornene-type polymers, compositions thereof and lithographic process using such compositions | Larry F. Rhodes, Chun Chang, Pramod Kandanarachchi, Lawrence Seger, Kotaro Endo +1 more | 2010-09-21 |
| 7776510 | Resist composition, method of forming resist pattern, compound and acid generator | Takeshi Iwai, Hideo Hada, Akiya Kawaue, Hiroaki Shimizu, Kyoko Ohshita +4 more | 2010-08-17 |
| 7745097 | Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern | Hideo Hada, Takeshi Iwai, Takehiro Seshimo, Akiya Kawaue | 2010-06-29 |
| 7713679 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Yoshiyuki Utsumi, Akiya Kawaue, Takehiro Seshimo, Hideo Hada | 2010-05-11 |
| 7541138 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato +6 more | 2009-06-02 |
| 7527909 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato +6 more | 2009-05-05 |
| 7501220 | Resist composition | Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato +6 more | 2009-03-10 |
| 7488568 | Resist composition, method of forming resist pattern, compound and acid generator | Takeshi Iwai, Hideo Hada, Masaru Takeshita, Akiya Kawaue, Hiroaki Shimizu +6 more | 2009-02-10 |