Issued Patents All Time
Showing 26–50 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7932013 | Pattern coating material and pattern forming method | Shogo Matsumaru, Toshiyuki Ogata, Kiyoshi Ishikawa, Shigenori Fujikawa, Toyoki Kunitake | 2011-04-26 |
| 7927780 | Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator | Akiya Kawaue, Takeshi Iwai, Shinichi Hidesaka, Tsuyoshi Kurosawa, Natsuko Maruyama +4 more | 2011-04-19 |
| 7910284 | Materials for photoresist, photoresist composition and method of forming resist pattern | Kyoko Kojima, Daiju Shiono | 2011-03-22 |
| 7901865 | Resist composition and process for formation of resist patterns | Taku Hirayama, Daiju Shiono | 2011-03-08 |
| 7897319 | Positive resist composition and method of forming resist pattern | Daiju Shiono, Taku Hirayama | 2011-03-01 |
| 7879528 | Resist composition for electron beam or EUV | Takeo Watanabe, Hiroo Kinoshita | 2011-02-01 |
| 7862981 | Compound, positive resist composition and method of forming resist pattern | Daiju Shiono, Taku Hirayama | 2011-01-04 |
| 7855044 | Positive resist composition and method of forming resist pattern | Masaru Takeshita, Takeshi Iwai | 2010-12-21 |
| 7851127 | Polymer compound, positive resist composition and resist pattern forming method | Toshiyuki Ogata, Shogo Matsumaru | 2010-12-14 |
| 7851129 | Resist composition, resist pattern forming method and compound | Daiju Shiono, Taku Hirayama, Toshiyuki Ogata | 2010-12-14 |
| 7829259 | Resin for photoresist composition, photoresist composition and method for forming resist pattern | Masaru Takeshita, Shogo Matsumaru, Hiroaki Shimizu | 2010-11-09 |
| 7807328 | Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method | Toshiyuki Ogata, Syogo Matsumaru | 2010-10-05 |
| 7776510 | Resist composition, method of forming resist pattern, compound and acid generator | Takeshi Iwai, Keita Ishiduka, Akiya Kawaue, Hiroaki Shimizu, Kyoko Ohshita +4 more | 2010-08-17 |
| 7771911 | Process for producing photoresist composition, filter, coater and photoresist composition | Takeshi Iwai, Masaaki Shimazaki, Masaaki Muroi, Kota Atsuchi, Hiroaki Tomida +1 more | 2010-08-10 |
| 7763412 | Polymer, positive resist composition and method for forming resist pattern | Masaru Takeshita, Ryotaro Hayashi, Takeshi Iwai, Syogo Matsumaru, Satoshi Fujimura | 2010-07-27 |
| 7745097 | Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern | Takeshi Iwai, Takehiro Seshimo, Akiya Kawaue, Keita Ishiduka | 2010-06-29 |
| 7741008 | Positive resist composition, positive resist composition for thermal flow, and resist pattern forming method | Sanae Furuya, Yusuke Nakagawa, Akiyoshi Yamazaki | 2010-06-22 |
| 7736842 | Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist pattern | Daiju Shiono, Hiroo Kinoshita, Takeo Watanabe | 2010-06-15 |
| 7723007 | Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method | Toshiyuki Ogata, Syogo Matsumaru, Yohei Kinoshita, Daiju Shiono, Hiroaki Shimizu +1 more | 2010-05-25 |
| 7713679 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Keita Ishiduka, Yoshiyuki Utsumi, Akiya Kawaue, Takehiro Seshimo | 2010-05-11 |
| 7700259 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | Toshiyuki Ogata, Syogo Matsumaru, Masaaki Yoshida | 2010-04-20 |
| 7682772 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Takehiro Seshimo, Yoshiyuki Utsumi, Akiya Kawaue, Hiroaki Shimizu, Tsuyoshi Nakamura | 2010-03-23 |
| 7682770 | Resist composition and method for forming resist pattern | Masaru Takeshita, Ryotaro Hayashi, Syogo Matsumaru, Taku Hirayama, Hiroaki Shimizu | 2010-03-23 |
| 7648816 | Positive resist composition, method for forming resist pattern and compound | Daiju Shiono, Taku Hirayama | 2010-01-19 |
| 7592123 | Resin for photoresist composition, photoresist composition and method for forming resist pattern | Masaru Takeshita, Shogo Matsumaru, Hiroaki Shimizu | 2009-09-22 |