Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8741538 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | Toshiyuki Ogata, Hideo Hada, Masaaki Yoshida | 2014-06-03 |
| 7807328 | Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method | Toshiyuki Ogata, Hideo Hada | 2010-10-05 |
| 7763412 | Polymer, positive resist composition and method for forming resist pattern | Masaru Takeshita, Hideo Hada, Ryotaro Hayashi, Takeshi Iwai, Satoshi Fujimura | 2010-07-27 |
| 7723007 | Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method | Toshiyuki Ogata, Yohei Kinoshita, Hideo Hada, Daiju Shiono, Hiroaki Shimizu +1 more | 2010-05-25 |
| 7700259 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | Toshiyuki Ogata, Hideo Hada, Masaaki Yoshida | 2010-04-20 |
| 7682770 | Resist composition and method for forming resist pattern | Hideo Hada, Masaru Takeshita, Ryotaro Hayashi, Taku Hirayama, Hiroaki Shimizu | 2010-03-23 |
| 7592122 | Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist composition | Toshiyuki Ogata, Kotaro Endo, Hiromitsu Tsuji, Masaaki Yoshida, Mitsuru Sato +1 more | 2009-09-22 |