Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11822240 | Resist composition and method of forming resist pattern | Yosuke Suzuki, Yoichi Hori, Takahiro Kojima, Mari MURATA | 2023-11-21 |
| 11650497 | Resist composition and method of forming resist pattern | Yoichi Hori | 2023-05-16 |
| 11586111 | Resist composition and method of forming resist pattern | Masahito Yahagi, Yoichi Hori, Takahiro Kojima | 2023-02-21 |
| 11392033 | Resist composition and method of forming resist pattern | Hitoshi Yamano, Takahiro Kojima, Yoichi Hori, Masahito Yahagi | 2022-07-19 |
| 11275306 | Resist composition and method of forming resist pattern | Takahiro Kojima, Masahito Yahagi, Yoichi Hori | 2022-03-15 |
| 11187981 | Resist composition and method of forming resist pattern | Yoichi Hori, Masahito Yahagi, Hitoshi Yamano, Takahiro Kojima | 2021-11-30 |
| 9040220 | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern | Hideo Hada, Yoshiyuki Utsumi, Keita Ishiduka, Kensuke Matsuzawa, Fumitake Kaneko +2 more | 2015-05-26 |
| 9034556 | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern | Hideo Hada, Yoshiyuki Utsumi, Keita Ishiduka, Kensuke Matsuzawa, Fumitake Kaneko +2 more | 2015-05-19 |
| 8900788 | Resist composition for immersion exposure and method of forming resist pattern | Yoshiyuki Utsumi | 2014-12-02 |
| 8877432 | Method of forming resist pattern and resist composition | Jiro Yokoya, Tsuyoshi Nakamura, Masaru Takeshita, Hirokuni Saito | 2014-11-04 |
| 8530598 | Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin | Masaru Takeshita | 2013-09-10 |
| 8486605 | Positive resist composition and method of forming resist pattern | Masaru Takeshita, Jiro Yokoya, Hirokuni Saito, Tsuyoshi Nakamura | 2013-07-16 |
| 8338075 | Positive resist composition and method of forming resist pattern | Masaru Takeshita, Shinji Kumada, Takeshi Iwai, Tsuyoshi Nakamura | 2012-12-25 |
| 8247161 | Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin | Masaru Takeshita | 2012-08-21 |
| 8227169 | Compound, acid generator, resist composition, and method of forming resist pattern | Akiya Kawaue, Yoshiyuki Utsumi, Takehito Seo, Hideo Hada, Kotaro Endo +2 more | 2012-07-24 |
| 8105747 | Positive resist composition and method of forming resist pattern | Yoshiyuki Utsumi, Hiroaki Shimizu, Kyoko Ohshita | 2012-01-31 |
| 8012669 | Resist composition and method of forming resist pattern | Hiroaki Shimizu, Yoshiyuki Utumi, Hideo Hada | 2011-09-06 |
| 7799507 | Positive resist composition for immersion lithography and method for forming resist pattern | Kotaro Endo, Makiko Irie, Takeshi Iwai, Yoshiyuki Utsumi, Tsuyoshi Nakamura | 2010-09-21 |
| 7494762 | Positive resist composition for immersion lithography and method for forming resist pattern | Makiko Irie | 2009-02-24 |
| 6617021 | Adhesive composition and adhesive sheet for semiconductor devices | Masaharu Kobayashi, Osamu Oka | 2003-09-09 |
| 5383162 | Semiconductor memory device | Masaki Shirai, Hisahiro Moriuchi, Kenichi Kuroda, Akinori Matsuo | 1995-01-17 |