Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6884566 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | Tsuyoshi Nakamura, Atsushi Sawano, Kousuke Doi, Hidekatsu Kohara | 2005-04-26 |
| 6517993 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | Tsuyoshi Nakamura, Atsushi Sawano, Kousuke Doi, Hidekatsu Kohara | 2003-02-11 |