Issued Patents All Time
Showing 26–33 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5738968 | Positive photoresist composition | Hiroshi Hosoda, Taku Hirayama, Satoshi Niikura, Hidekatsu Kohara, Toshimasa Nakayama | 1998-04-14 |
| 5702861 | Positive photoresist composition | Satoshi Niikura, Takako Suzuki, Hidekatsu Kohara, Toshimasa Nakayama | 1997-12-30 |
| 5601961 | High-sensitivity positive-working photoresist composition | Kazuhiko Nakayama, Taku Nakao, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1997-02-11 |
| 5501936 | Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound | Hiroshi Hosoda, Remi Numata, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1996-03-26 |
| 5478692 | Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone | Taku Nakao, Remi Numata, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1995-12-26 |
| 5434031 | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | Taku Nakao, Remi Numata, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1995-07-18 |
| 5401605 | Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound | Hiroshi Hosoda, Kouichi Takahashi, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1995-03-28 |
| 5384228 | Alkali-developable positive-working photosensitive resin composition | Satoshi Niikura, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1995-01-24 |