TS

Takako Suzuki

TC Tokyo Ohka Kogyo Co.: 8 patents #145 of 684Top 25%
Canon: 3 patents #11,241 of 19,416Top 60%
IBM: 3 patents #26,272 of 70,183Top 40%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
TC Toshiba Client Solutions Co.: 1 patents #33 of 84Top 40%
Overall (All Time): #293,922 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
10996582 Image forming apparatus 2021-05-04
10969732 Image forming apparatus including optical print head 2021-04-06
10739718 Image forming apparatus 2020-08-11
10497079 Electronic device and method for managing image Daisuke Hirakawa, Yuuji Irimoto 2019-12-03
9537940 Exchange of information between processing servers Jingyang Zhao 2017-01-03
9300765 Exchange of information between processing servers Jingyang Zhao 2016-03-29
7910281 Positive resist composition for thin-film implantation process and method for forming resist pattern Ken Tanaka, Koji Yonemura, Shoichi Fujita 2011-03-22
7359497 Audio teleconference system with wireless communication portable terminals Hisayuki Morishima, Yuuki Yamamoto, Takashi Ohno, Satoshi Okuyama, Kenichi Horio +3 more 2008-04-15
6964838 Positive photoresist composition Masaki Kurihara, Kenji Maruyama, Satoshi Niikura, Kousuke Doi 2005-11-15
6640225 Search method using an index file and an apparatus therefor Nobuaki Takishita 2003-10-28
6566031 Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama 2003-05-20
6406827 Positive photoresist composition and process for forming resist pattern Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama 2002-06-18
6379859 Positive photoresist composition and process for forming resist pattern using same Sachiko Tamura, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama 2002-04-30
6300033 Positive photoresist composition and process for forming resist pattern Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama 2001-10-09
6030741 Positive resist composition Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama 2000-02-29
5702861 Positive photoresist composition Satoshi Niikura, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama 1997-12-30