Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6939926 | Phenol novolak resin, production process thereof, and positive photoresist composition using the same | Ken Miyagi, Yasuhide Ohuchi, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 2005-09-06 |
| 6475694 | Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group | Kousuke Doi, Ken Miyagi, Hidekatsu Kohara, Toshimasa Nakayama | 2002-11-05 |
| 6187500 | Positive photoresist compositions and multilayer resist materials using same | Ken Miyagi, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 2001-02-13 |