Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9012125 | Resist composition and method of forming resist pattern | Shinji Kumada, Masatoshi Arai, Daiju Shiono | 2015-04-21 |
| 8349549 | Resist surface modifying liquid, and method for formation of resist pattern using the same | Tomoya Kumagai | 2013-01-08 |
| 7629105 | Positive photoresist composition and method of forming resist pattern | Akiyoshi Yamazaki, Kazuo Tani, Naoto Motoike, Sachiko Yoshizawa | 2009-12-08 |
| 7094924 | Method for decreasing surface defects of patterned resist layer | Kazuyuki Nitta, Taku Nakao, Tatsuya Matsumi | 2006-08-22 |
| 6818380 | Method for the preparation of a semiconductor device | Kazufumi Sato, Kazuyuki Nitta, Katsumi Oomori, Kazuo Tani, Yohei Kinoshita +1 more | 2004-11-16 |
| 6777158 | Method for the preparation of a semiconductor device | Kazufumi Sato, Kazuyuki Nitta, Katsumi Oomori, Kazuo Tani, Yohei Kinoshita +1 more | 2004-08-17 |
| 6677103 | Positive-working photoresist composition | Kazufumi Sato, Taku Nakao, Kazuyuki Nitta | 2004-01-13 |
| 6605417 | Method for decreasing surface defects of patterned resist layer | Kazuyuki Nitta, Taku Nakao, Tatsuya Matsumi | 2003-08-12 |
| 6444394 | Positive-working photoresist composition | Kazufumi Sato, Taku Nakao, Kazuyuki Nitta | 2002-09-03 |