SK

Shota Katayama

TC Tokyo Ohka Kogyo Co.: 6 patents #187 of 684Top 30%
KU Kyoto University: 1 patents #568 of 1,688Top 35%
Overall (All Time): #715,891 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
11131927 Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated article Akiya Kawaue, Kazuaki Ebisawa 2021-09-28
11061326 Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound Akiya Kawaue, Yasushi Kuroiwa, Kazuaki Ebisawa 2021-07-13
11016387 Chemically amplified positive-type photosensitive resin composition, method of manufacturing substrate with template, and method of manufacturing plated article Kazuaki Ebisawa 2021-05-25
10604770 Method for extracting differentiated cells Hirohide Saito, Kei Endo, Callum Parr 2020-03-31
10054855 Chemically amplified positive-type photosensitive resin composition Aya MOMOZAWA 2018-08-21
9557651 Chemically amplified positive-type photosensitive resin composition Yasushi Washio, Takahiro Shimizu 2017-01-31
9372403 Chemically amplified photosensitive resin composition and method for producing resist pattern using the same Makiko Irie 2016-06-21