Issued Patents All Time
Showing 51–56 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4833067 | Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant | Hatsuyuki Tanaka, Yoshiyuki Sato, Shingo Asaumi, Toshimasa Nakayama, Akira Yokota +1 more | 1989-05-23 |
| 4820621 | Developer solution for positive-working photoresist compositions comprising a base and a non-ionic surfactant | Hatsuyuki Tanka, Yoshiyuki Sato, Toshimasa Nakayama | 1989-04-11 |
| 4804612 | Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation | Shingo Asaumi, Hatsuyuki Tanaka, Toshimasa Nakayama | 1989-02-14 |
| 4784937 | Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant | Hatsuyuki Tanaka, Yoshiyuki Sato, Shingo Asaumi, Toshimasa Nakayama, Akira Yokota +1 more | 1988-11-15 |
| 4740451 | Photosensitive compositions and a method of patterning using the same | — | 1988-04-26 |
| 4731319 | Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins | Hatsuyuki Tanaka, Masanori Miyabe, Yoshiaki Arai, Shingo Asaumi, Toshimasa Nakayama | 1988-03-15 |