Issued Patents All Time
Showing 26–50 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5702861 | Positive photoresist composition | Satoshi Niikura, Takako Suzuki, Kousuke Doi, Toshimasa Nakayama | 1997-12-30 |
| 5702862 | Positive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanone | Hayato Ohno, Taku Nakao, Hisanobu Harada, Shinichi Hidesaka, Toshimasa Nakayama | 1997-12-30 |
| 5604077 | Positive-working photoresist composition comprising a novolac resin made in butyrolactone as a solvent | Shinichi Kono, Hayato Ohno, Toshimasa Nakayama | 1997-02-18 |
| 5601961 | High-sensitivity positive-working photoresist composition | Kazuhiko Nakayama, Taku Nakao, Kousuke Doi, Nobuo Tokutake, Toshimasa Nakayama | 1997-02-11 |
| 5599653 | Pattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layer | Taku Nakao, Hiroyuki Yamazaki, Nobuo Tokutake, Masato Saito, Toshimasa Nakayama | 1997-02-04 |
| 5576138 | Positive-working naphtho quinone diazide sulfonic acid ester photoresist composition containing select combination of additives | Yoshito Ando, Atsushi Sawano, Nobuo Tokutake, Toshimasa Nakayama | 1996-11-19 |
| 5552255 | Article utilizing quinone diazide resist layer on tantalum substrate surface | Tetsuya Kato, Kouichi Takahashi, Toshimasa Nakayama | 1996-09-03 |
| 5518860 | Positive-working quinonediazide photoresist composition containing hydroxyalkyl substituted pyridine compound | Satoshi Niikura, Jun Koshiyama, Tetsuya Kato, Kouichi Takahashi, Toshimasa Nakayama | 1996-05-21 |
| 5501936 | Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound | Hiroshi Hosoda, Remi Numata, Kousuke Doi, Nobuo Tokutake, Toshimasa Nakayama | 1996-03-26 |
| 5498514 | Lithographic double-coated patterning plate with undercoat levelling layer | Taku Nakao, Hiroyuki Yamazaki, Nobuo Tokutake, Masato Saito, Toshimasa Nakayama | 1996-03-12 |
| 5478692 | Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone | Kousuke Doi, Taku Nakao, Remi Numata, Nobuo Tokutake, Toshimasa Nakayama | 1995-12-26 |
| 5434031 | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | Taku Nakao, Remi Numata, Kousuke Doi, Nobuo Tokutake, Toshimasa Nakayama | 1995-07-18 |
| 5401605 | Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound | Kousuke Doi, Hiroshi Hosoda, Kouichi Takahashi, Nobuo Tokutake, Toshimasa Nakayama | 1995-03-28 |
| 5401617 | Method for forming positive patterned resist layer on tantalum substrate utilizing quinone diazide composition with aromatic hydroxy additive | Tetsuya Kato, Kouichi Takahashi, Toshimasa Nakayama | 1995-03-28 |
| 5384228 | Alkali-developable positive-working photosensitive resin composition | Kousuke Doi, Satoshi Niikura, Nobuo Tokutake, Toshimasa Nakayama | 1995-01-24 |
| 5332647 | "Positive-working quinone diazide composition containing N,N',N""-substituted isocyanurate compound and associated article" | Hayato Ohno, Nobuo Tokutake, Satoshi Niikura, Toshimasa Nakayama | 1994-07-26 |
| 5281508 | Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol | Hatsuyuki Tanaka, Masanori Miyabe, Yoshiaki Arai, Shingo Asaumi, Toshimasa Nakayama +2 more | 1994-01-25 |
| 5180653 | Electron beam-curable resist composition and method for fine patterning using the same | Masanori Miyabe, Toshimasa Nakayama | 1993-01-19 |
| 5100758 | Positive-working photoresist composition containing quinone diazide compound, novolak resin and alkyl pyruvate solvent | Hatsuyuki Tanaka, Toshimasa Nakayama | 1992-03-31 |
| 5057397 | Electron beam-curable resist composition and method for fine patterning using the same | Masanori Miyabe, Toshimasa Nakayama | 1991-10-15 |
| 4985333 | Positive-working photosensitive composition with three difference 1,2-naphthoquinone diazide sulfonic acid esters to include the ester of curcumin | Nobuo Tokutake, Koichi Takahashi, Yoshiyuki Satoh, Toshimasa Nakayama | 1991-01-15 |
| 4983020 | Dyeing resistant insulation film of high quality for a color filter for use in a solid-state image pickup element | Toshimasa Nakayama, Naoki Aoyanagi, Daisuke Hayashi | 1991-01-08 |
| 4906549 | Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms | Shingo Asaumi, Hatsuyuki Tanaka, Masanori Miyabe, Toshimasa Nakayama | 1990-03-06 |
| 4882260 | Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye | Nobuo Tokutake, Masanori Miyabe, Toshimasa Nakayama, Shingo Asaumi, Hatsuyuki Tanaka +1 more | 1989-11-21 |
| 4873177 | Method for forming a resist pattern on a substrate surface and a scum-remover therefor | Hatsuyuki Tanaka, Yoshiyuki Sato, Toshimasa Nakayama | 1989-10-10 |