Issued Patents All Time
Showing 26–32 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5856058 | Chemical-sensitization positive-working photoresist composition | Kazufumi Sato, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1999-01-05 |
| 5854357 | Process for the production of polyhydroxstyrene | Mitsuru Sato, Akiyoshi Yamazaki, Etsuko Iguchi, Yoshika Sakai, Kazufumi Sato +1 more | 1998-12-29 |
| 5817444 | Positive-working photoresist composition and multilayered resist material using the same | Kazufumi Sato, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1998-10-06 |
| 5800964 | Photoresist composition | Mitsuru Sato, Hideo Hada, Tatsuya Hashiguchi, Hiroshi Komano, Toshimasa Nakayama | 1998-09-01 |
| 5770343 | Positive-working photoresist composition | Kazufumi Sato, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1998-06-23 |
| 5736296 | Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound | Mitsuru Sato, Akiyoshi Yamazaki, Etsuko Iguchi, Yoshika Sakai, Kazufumi Sato +1 more | 1998-04-07 |
| 5728504 | Positive photoresist compositions and multilayer resist materials using the same | Hiroshi Hosoda, Satoshi Niikura, Atsushi Sawano, Tatsuya Hashiguchi, Hidekatsu Kohara +1 more | 1998-03-17 |