Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6225476 | Positive-working photoresist composition | Hideo Hada, Hiroshi Komano | 2001-05-01 |
| 6159652 | Positive resist composition | Mitsuru Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Etsuko Iguchi, Yoshika Sakai +1 more | 2000-12-12 |
| 6087063 | Positive-working photoresist composition | Hideo Hada, Hiroshi Komano | 2000-07-11 |
| 6077644 | Positive-working resist composition | Hideo Hada, Hiroshi Komano, Toshimasa Nakayama | 2000-06-20 |
| 5976760 | Chemical-sensitization resist composition | Katsumi Oomori, Hideo Hada, Fumitake Kaneko, Mitsuru Sato, Toshimasa Nakayama | 1999-11-02 |
| 5955240 | Positive resist composition | Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1999-09-21 |
| 5948589 | Positive-working photoresist composition | Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1999-09-07 |
| 5945517 | Chemical-sensitization photoresist composition | Kazuyuki Nitta, Toshiharu Shimamaki, Kunio Hayakawa, Shin-ya Kuramoto | 1999-08-31 |
| 5945248 | Chemical-sensitization positive-working photoresist composition | Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1999-08-31 |
| 5929271 | Compounds for use in a positive-working resist composition | Hideo Hada, Hiroshi Komano, Toshimasa Nakayama | 1999-07-27 |
| 5908730 | Chemical-sensitization photoresist composition | Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1999-06-01 |
| 5874195 | Positive-working photoresist composition | Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1999-02-23 |
| 5856058 | Chemical-sensitization positive-working photoresist composition | Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1999-01-05 |
| 5854357 | Process for the production of polyhydroxstyrene | Mitsuru Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Etsuko Iguchi, Yoshika Sakai +1 more | 1998-12-29 |
| 5817444 | Positive-working photoresist composition and multilayered resist material using the same | Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1998-10-06 |
| 5770343 | Positive-working photoresist composition | Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1998-06-23 |
| 5736296 | Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound | Mitsuru Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Etsuko Iguchi, Yoshika Sakai +1 more | 1998-04-07 |
| 5483132 | Control device for motor-driven telescopic antenna | Koji Arata, Yuji Maeda | 1996-01-09 |
| 4990836 | Motorized automobile antenna control device | Kazuhiko Nakase | 1991-02-05 |