Issued Patents All Time
Showing 26–50 of 112 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6171749 | Negative-working chemical-amplification photoresist composition | Toshikazu Tachikawa, Fumitake Kaneko, Satoshi Fujimura, Miwa Miyairi, Hiroshi Komano | 2001-01-09 |
| 6159652 | Positive resist composition | Mitsuru Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Etsuko Iguchi, Yoshika Sakai +1 more | 2000-12-12 |
| 6136505 | Liquid coating composition for use in forming antireflective film and photoresist material using said antireflective film | Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi, Hiroshi Komano | 2000-10-24 |
| 6132928 | Coating solution for forming antireflective coating film | Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi | 2000-10-17 |
| 6127087 | Positive photoresist compositions and multilayer resist materials using same | Miki Kobayashi, Kousuke Doi, Sachiko Tamura, Hidekatsu Kohara | 2000-10-03 |
| 6120969 | Polyphenol compound, quinonediazide ester and positive photoresist composition | Mitsuo Hagihara, Kousuke Doi, Hidekatsu Kohara, Tetsuya Nakajima | 2000-09-19 |
| 6106994 | Production process of polyphenol diesters, and positive photosensitive compositions | Satoshi Niikura, Hidekatsu Kohara | 2000-08-22 |
| 6083657 | Positive photoresist compositions and a process for producing the same | Shinichi Kono, Yasuo Masuda, Atsushi Sawano, Hayato Ohno, Hidekatsu Kohara | 2000-07-04 |
| 6083665 | Photoresist laminate and method for patterning using the same | Mitsuru Sato, Katsumi Oomori, Etsuko Iguchi, Kiyoshi Ishikawa, Fumitake Kaneko | 2000-07-04 |
| 6077644 | Positive-working resist composition | Hideo Hada, Kazufumi Sato, Hiroshi Komano | 2000-06-20 |
| 6071673 | Method for the formation of resist pattern | Etsuko Iguchi, Taiichiro Aoki | 2000-06-06 |
| 6068000 | Substrate treatment method | Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi | 2000-05-30 |
| 6030741 | Positive resist composition | Kousuke Doi, Takako Suzuki, Hidekatsu Kohara | 2000-02-29 |
| 5985525 | Developer solution for photoresist composition | Mitsuru Sato, Hatsuyuki Tanaka | 1999-11-16 |
| 5976760 | Chemical-sensitization resist composition | Katsumi Oomori, Hideo Hada, Fumitake Kaneko, Mitsuru Sato, Kazufumi Sato | 1999-11-02 |
| 5968848 | Process for treating a lithographic substrate and a rinse solution for the treatment | Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi | 1999-10-19 |
| 5955240 | Positive resist composition | Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai | 1999-09-21 |
| 5955241 | Chemical-amplification-type negative resist composition and method for forming negative resist pattern | Mitsuru Sato, Kiyoshi Ishikawa, Hiroyuki Yamazaki, Yoshiki Sugeta | 1999-09-21 |
| 5948589 | Positive-working photoresist composition | Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai | 1999-09-07 |
| 5945248 | Chemical-sensitization positive-working photoresist composition | Kazuyuki Nitta, Kazufumi Sato, Akiyoshi Yamazaki, Yoshika Sakai | 1999-08-31 |
| 5929271 | Compounds for use in a positive-working resist composition | Hideo Hada, Kazufumi Sato, Hiroshi Komano | 1999-07-27 |
| 5925495 | Photoresist laminate and method for patterning using the same | Mitsuru Sato, Katsumi Oomori, Etsuko Iguchi, Kiyoshi Ishikawa, Fumitake Kaneko | 1999-07-20 |
| 5908738 | Undercoating composition for photolithography | Mitsuru Sato, Katsumi Oomori, Kiyoshi Ishikawa, Etsuko Iguchi | 1999-06-01 |
| 5908730 | Chemical-sensitization photoresist composition | Kazuyuki Nitta, Kazufumi Sato, Akiyoshi Yamazaki, Yoshika Sakai | 1999-06-01 |
| 5905063 | Remover solution composition for resist and method for removing resist using the same | Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi | 1999-05-18 |