Issued Patents All Time
Showing 76–100 of 112 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5614271 | Method for the formation of a silica-based coating film | Tatsuhiko Shibuya, Susumu Okano, Hideya Kobari, Yoshio Hagiwara | 1997-03-25 |
| 5614251 | Method and liquid coating composition for the formation of silica-based coating film on substrate surface | Yoshinori Sakamoto, Yoshio Hagiwara, Hatsuyuki Tanaka | 1997-03-25 |
| 5604077 | Positive-working photoresist composition comprising a novolac resin made in butyrolactone as a solvent | Shinichi Kono, Hayato Ohno, Hidekatsu Kohara | 1997-02-18 |
| 5601961 | High-sensitivity positive-working photoresist composition | Kazuhiko Nakayama, Taku Nakao, Kousuke Doi, Nobuo Tokutake, Hidekatsu Kohara | 1997-02-11 |
| 5599653 | Pattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layer | Taku Nakao, Hiroyuki Yamazaki, Nobuo Tokutake, Masato Saito, Hidekatsu Kohara | 1997-02-04 |
| 5576138 | Positive-working naphtho quinone diazide sulfonic acid ester photoresist composition containing select combination of additives | Yoshito Ando, Atsushi Sawano, Nobuo Tokutake, Hidekatsu Kohara | 1996-11-19 |
| 5552255 | Article utilizing quinone diazide resist layer on tantalum substrate surface | Tetsuya Kato, Kouichi Takahashi, Hidekatsu Kohara | 1996-09-03 |
| 5543268 | Developer solution for actinic ray-sensitive resist | Hatsuyuki Tanaka, Mitsuru Sato, Hiroshi Komano | 1996-08-06 |
| 5520952 | Method for forming a protective coating film on electronic parts and devices | Katsuya Tanitsu, Atsushi Kawakami, Hatsuyuki Tanaka | 1996-05-28 |
| 5518860 | Positive-working quinonediazide photoresist composition containing hydroxyalkyl substituted pyridine compound | Satoshi Niikura, Jun Koshiyama, Tetsuya Kato, Kouichi Takahashi, Hidekatsu Kohara | 1996-05-21 |
| 5501936 | Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound | Hiroshi Hosoda, Remi Numata, Kousuke Doi, Nobuo Tokutake, Hidekatsu Kohara | 1996-03-26 |
| 5498514 | Lithographic double-coated patterning plate with undercoat levelling layer | Taku Nakao, Hiroyuki Yamazaki, Nobuo Tokutake, Masato Saito, Hidekatsu Kohara | 1996-03-12 |
| 5496402 | Method and liquid coating composition for the formation of silica-based coating film on substrate surface | Yoshinori Sakamoto, Yoshio Hagiwara, Hatsuyuki Tanaka | 1996-03-05 |
| 5478692 | Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone | Kousuke Doi, Taku Nakao, Remi Numata, Nobuo Tokutake, Hidekatsu Kohara | 1995-12-26 |
| 5457153 | Liquid coating composition | Yoshio Hagiwara, Isao Satoh, Hatsuyuki Tanaka | 1995-10-10 |
| 5434031 | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | Taku Nakao, Remi Numata, Kousuke Doi, Nobuo Tokutake, Hidekatsu Kohara | 1995-07-18 |
| 5401605 | Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound | Kousuke Doi, Hiroshi Hosoda, Kouichi Takahashi, Nobuo Tokutake, Hidekatsu Kohara | 1995-03-28 |
| 5401617 | Method for forming positive patterned resist layer on tantalum substrate utilizing quinone diazide composition with aromatic hydroxy additive | Tetsuya Kato, Kouichi Takahashi, Hidekatsu Kohara | 1995-03-28 |
| 5384228 | Alkali-developable positive-working photosensitive resin composition | Kousuke Doi, Satoshi Niikura, Nobuo Tokutake, Hidekatsu Kohara | 1995-01-24 |
| 5368783 | Negative-working radiation-sensitive resist composition | Masakazu Kobayashi, Hatsuyuki Tanaka | 1994-11-29 |
| 5332647 | "Positive-working quinone diazide composition containing N,N',N""-substituted isocyanurate compound and associated article" | Hayato Ohno, Nobuo Tokutake, Satoshi Niikura, Hidekatsu Kohara | 1994-07-26 |
| 5281508 | Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol | Hidekatsu Kohara, Hatsuyuki Tanaka, Masanori Miyabe, Yoshiaki Arai, Shingo Asaumi +2 more | 1994-01-25 |
| 5180653 | Electron beam-curable resist composition and method for fine patterning using the same | Masanori Miyabe, Hidekatsu Kohara | 1993-01-19 |
| 5100758 | Positive-working photoresist composition containing quinone diazide compound, novolak resin and alkyl pyruvate solvent | Hatsuyuki Tanaka, Hidekatsu Kohara | 1992-03-31 |
| 5057397 | Electron beam-curable resist composition and method for fine patterning using the same | Masanori Miyabe, Hidekatsu Kohara | 1991-10-15 |