Issued Patents All Time
Showing 101–112 of 112 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4997748 | Developer solution for positive-working resist composition | Yasuyuki Takeda, Hatsuyuki Tanaka | 1991-03-05 |
| 4985333 | Positive-working photosensitive composition with three difference 1,2-naphthoquinone diazide sulfonic acid esters to include the ester of curcumin | Nobuo Tokutake, Koichi Takahashi, Yoshiyuki Satoh, Hidekatsu Kohara | 1991-01-15 |
| 4983020 | Dyeing resistant insulation film of high quality for a color filter for use in a solid-state image pickup element | Hidekatsu Kohara, Naoki Aoyanagi, Daisuke Hayashi | 1991-01-08 |
| 4944893 | Remover solution for resist | Hatsuyuki Tanaka, Masakazu Kobayashi, Kazumasa Wakiya | 1990-07-31 |
| 4906549 | Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms | Shingo Asaumi, Hidekatsu Kohara, Hatsuyuki Tanaka, Masanori Miyabe | 1990-03-06 |
| 4882260 | Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye | Hidekatsu Kohara, Nobuo Tokutake, Masanori Miyabe, Shingo Asaumi, Hatsuyuki Tanaka +1 more | 1989-11-21 |
| 4873177 | Method for forming a resist pattern on a substrate surface and a scum-remover therefor | Hatsuyuki Tanaka, Yoshiyuki Sato, Hidekatsu Kohara | 1989-10-10 |
| 4833067 | Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant | Hatsuyuki Tanaka, Hidekatsu Kohara, Yoshiyuki Sato, Shingo Asaumi, Akira Yokota +1 more | 1989-05-23 |
| 4820621 | Developer solution for positive-working photoresist compositions comprising a base and a non-ionic surfactant | Hatsuyuki Tanka, Yoshiyuki Sato, Hidekatsu Kohara | 1989-04-11 |
| 4804612 | Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation | Shingo Asaumi, Hidekatsu Kohara, Hatsuyuki Tanaka | 1989-02-14 |
| 4784937 | Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant | Hatsuyuki Tanaka, Hidekatsu Kohara, Yoshiyuki Sato, Shingo Asaumi, Akira Yokota +1 more | 1988-11-15 |
| 4731319 | Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins | Hidekatsu Kohara, Hatsuyuki Tanaka, Masanori Miyabe, Yoshiaki Arai, Shingo Asaumi | 1988-03-15 |