TN

Toshimasa Nakayama

TC Tokyo Ohka Kogyo Co.: 110 patents #1 of 684Top 1%
Overall (All Time): #11,557 of 4,157,543Top 1%
112
Patents All Time

Issued Patents All Time

Showing 51–75 of 112 patents

Patent #TitleCo-InventorsDate
5892095 Cyano group-containing oxime sulfonate compounds Hideo Hada, Hiroshi Komano 1999-04-06
5874195 Positive-working photoresist composition Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai 1999-02-23
5863710 Developer solution for photolithographic patterning Kazumasa Wakiya, Masakazu Kobayashi 1999-01-26
5856058 Chemical-sensitization positive-working photoresist composition Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai 1999-01-05
5854357 Process for the production of polyhydroxstyrene Mitsuru Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Etsuko Iguchi, Yoshika Sakai +1 more 1998-12-29
5853948 Positive photoresist compositions and multilayer resist materials using the same Atsushi Sawano, Junichi Mizuta, Kousuke Doi, Hidekatsu Kohara 1998-12-29
5817444 Positive-working photoresist composition and multilayered resist material using the same Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai 1998-10-06
5800964 Photoresist composition Mitsuru Sato, Kazuyuki Nitta, Hideo Hada, Tatsuya Hashiguchi, Hiroshi Komano 1998-09-01
5795702 Photoresist stripping liquid compositions and a method of stripping photoresists using the same Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi 1998-08-18
5795378 Coating solution for silica-based coating film and method for the preparation thereof Yoshinori Sakamoto, Yoshio Hagiwara 1998-08-18
5792274 Remover solution composition for resist and method for removing resist using the same Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi 1998-08-11
5783362 Liquid coating composition for use in forming photoresist coating films and a photoresist material using said composition Kazumasa Wakiya, Masakazu Kobayashi 1998-07-21
5770343 Positive-working photoresist composition Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai 1998-06-23
5762697 Coating solution for silica-based coating film and method for the preparation thereof Yoshinori Sakamoto, Yoshio Hagiwara 1998-06-09
5756255 Undercoating composition for photolithography Mitsuru Sato, Katsumi Oomori, Kiyoshi Ishikawa, Etsuko Iguchi 1998-05-26
5753421 Stock developer solutions for photoresists and developer solutions prepared by dilution thereof Mitsuru Sato, Masakazu Kobayashi 1998-05-19
5747224 Stock developer solutions for photoresists and developer solutions prepared by dilution thereof Mitsuru Sato, Masakazu Kobayashi 1998-05-05
5738968 Positive photoresist composition Hiroshi Hosoda, Taku Hirayama, Kousuke Doi, Satoshi Niikura, Hidekatsu Kohara 1998-04-14
5736296 Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound Mitsuru Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Etsuko Iguchi, Yoshika Sakai +1 more 1998-04-07
5728504 Positive photoresist compositions and multilayer resist materials using the same Hiroshi Hosoda, Satoshi Niikura, Atsushi Sawano, Tatsuya Hashiguchi, Kazuyuki Nitta +1 more 1998-03-17
5714625 Cyanooxime sulfonate compound Hideo Hada, Tatsuya Hashiguchi, Hiroshi Komano 1998-02-03
5702862 Positive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanone Hayato Ohno, Taku Nakao, Hisanobu Harada, Shinichi Hidesaka, Hidekatsu Kohara 1997-12-30
5702861 Positive photoresist composition Satoshi Niikura, Takako Suzuki, Kousuke Doi, Hidekatsu Kohara 1997-12-30
5662961 Method for forming a protective coating film on electronic parts and devices Katsuya Tanitsu, Atsushi Kawakami, Hatsuyuki Tanaka 1997-09-02
5631314 Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition Kazumasa Wakiya, Masakazu Kobayashi 1997-05-20