Issued Patents All Time
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5457153 | Liquid coating composition | Yoshio Hagiwara, Isao Satoh, Toshimasa Nakayama | 1995-10-10 |
| 5368783 | Negative-working radiation-sensitive resist composition | Masakazu Kobayashi, Toshimasa Nakayama | 1994-11-29 |
| 5281508 | Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol | Hidekatsu Kohara, Masanori Miyabe, Yoshiaki Arai, Shingo Asaumi, Toshimasa Nakayama +2 more | 1994-01-25 |
| 5100758 | Positive-working photoresist composition containing quinone diazide compound, novolak resin and alkyl pyruvate solvent | Hidekatsu Kohara, Toshimasa Nakayama | 1992-03-31 |
| 4997748 | Developer solution for positive-working resist composition | Yasuyuki Takeda, Toshimasa Nakayama | 1991-03-05 |
| 4944893 | Remover solution for resist | Masakazu Kobayashi, Kazumasa Wakiya, Toshimasa Nakayama | 1990-07-31 |
| 4906549 | Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms | Shingo Asaumi, Hidekatsu Kohara, Masanori Miyabe, Toshimasa Nakayama | 1990-03-06 |
| 4882260 | Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye | Hidekatsu Kohara, Nobuo Tokutake, Masanori Miyabe, Toshimasa Nakayama, Shingo Asaumi +1 more | 1989-11-21 |
| 4873177 | Method for forming a resist pattern on a substrate surface and a scum-remover therefor | Yoshiyuki Sato, Hidekatsu Kohara, Toshimasa Nakayama | 1989-10-10 |
| 4833067 | Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant | Hidekatsu Kohara, Yoshiyuki Sato, Shingo Asaumi, Toshimasa Nakayama, Akira Yokota +1 more | 1989-05-23 |
| 4824762 | Method for rinse treatment of a substrate | Masakazu Kobayashi, Shingo Asaumi | 1989-04-25 |
| 4804612 | Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation | Shingo Asaumi, Hidekatsu Kohara, Toshimasa Nakayama | 1989-02-14 |
| 4784937 | Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant | Hidekatsu Kohara, Yoshiyuki Sato, Shingo Asaumi, Toshimasa Nakayama, Akira Yokota +1 more | 1988-11-15 |
| 4731319 | Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins | Hidekatsu Kohara, Masanori Miyabe, Yoshiaki Arai, Shingo Asaumi, Toshimasa Nakayama | 1988-03-15 |