RD

Ralph R. Dammel

AU Az Electronic Materials Usa: 19 patents #2 of 135Top 2%
CL Clariant Finance (Bvi) Limited: 19 patents #5 of 535Top 1%
Hoechst Gmbh: 18 patents #156 of 4,020Top 4%
HC Hoechst Celanese: 14 patents #37 of 871Top 5%
HL Hoechst Japan Limited: 3 patents #20 of 137Top 15%
CL Clariant: 2 patents #240 of 540Top 45%
IBM: 1 patents #44,794 of 70,183Top 65%
BO Braggone Oy: 1 patents #3 of 11Top 30%
Infineon Technologies Ag: 1 patents #4,439 of 7,486Top 60%
AS Az Electronic Materials (Luxembourg) S.A.R.L.: 1 patents #75 of 145Top 55%
📍 Shizuoka, RI: #1 of 1 inventorsTop 100%
Overall (All Time): #24,533 of 4,157,543Top 1%
77
Patents All Time

Issued Patents All Time

Showing 51–75 of 77 patents

Patent #TitleCo-InventorsDate
5476750 Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists M. Dalil Rahman, Ping-Hung Lu, Daniel P. Aubin, Dana L. Durham 1995-12-19
5424166 Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom Georg Pawlowski, Horst Roeschert, Walter Spiess, Winfried Meier 1995-06-13
5403697 Positive radiation-sensitive mixture and recording material produced therefrom Karl-Friedrich Doessel, Juergen Lingnau 1995-04-04
5401608 Negative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith Georg Pawlowski, Horst Roeschert, Winfried Meier, Walter Spiess, Klaus-Juergen Przybilla 1995-03-28
5348842 Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride Dinesh N. Khanna, Douglas McKenzie, Chester J. Sobodacha 1994-09-20
5346806 Acid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture Georg Pawlowski, Horst Roeschert, Walter Spiess, Charlotte Eckes 1994-09-13
5346804 Acid-cleavable radiation-sensitive compounds, positive working radiation-sensitive mixture containing theses compounds, and radiation-sensitive recording material produced with this mixture Geog Pawlowski, Horst Roeschert, Walter Spiess, Charlotte Eckes 1994-09-13
5342727 Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition Richard Vicari, Douglas J. Gordon, William D. Hinsberg, Dennis McKean, Carlton G. Willson 1994-08-30
5340682 Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an .alpha.-carbonyl-.alpha.-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound Georg Pawlowski, Hans-Joachim Merrem, Juergen Lingnau, Horst Roeschert 1994-08-23
5338641 Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an .alpha.,.alpha.-bis(sulfonyl) diazo methane as an acid forming compound Georg Pawlowski, Hans-Joachim Merrem, Juergen Lingnau, Horst Roeschert 1994-08-16
5326826 Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation Horst Roeschert, Hans-Joachim Merrem, Georg Pawlowski, Juergen Fuchs 1994-07-05
5302488 Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material Horst Roeschert, Hans-Joachim Merrem, Georg Pawlowski, Juergen Fuchs 1994-04-12
5286602 Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture Georg Pawlowski, Horst Roeschert, Walter Spiess 1994-02-15
5256517 Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having .alpha.-.beta.-keto ester units and sulfonate units Horst Roeschert, Georg Pawlowski, Hans-Joachim Merrem, Walter Spiess 1993-10-26
5247096 Process for preparing N-tert-butoxycarbonylmaleimide Horst Roeschert, Georg Pawlowski, Klaus-Juergen Przybilla 1993-09-21
5234791 Radiation-curable composition and radiation-sensitive recording material prepared therefrom for use with high-energy radiation Karl-Friedrich Doessel, Juergen Lingnau, Juergen Theis 1993-08-10
5221592 Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester Dinesh N. Khanna, Douglas McKenzie, Chester J. Sobodacha 1993-06-22
5217843 Positive radiation-sensitive mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation Juergen Lingnau, Georg Pawlowski, Juergen Theis 1993-06-08
5198322 Positively operating radiation-sensitive mixture containing a polyfunctional .alpha.-diazo-.beta.-keto ester and radiation-sensitive recording material containing this mixture Peter Wilharm, Hans-Joachim Merrem, Georg Pawlowski 1993-03-30
5191069 Polyfunctional compounds containing .alpha.-diazo-.beta.-keto ester units and sulfonate units Horst Roeschert, Georg Pawlowski, Hans-Joachim Merrem 1993-03-02
5072025 Process for the production of 3,5-disubstituted-4-acetoxystyrene Richard Vicari, Mohammad Aslam, Wilson B. Ray, Kenneth G. Davenport, Juergen Lingnau +1 more 1991-12-10
4965400 Preparation of 3,5-disubstituted-4-acetoxystyrene Richard Vicari, Mohammad Aslam, Wilson B. Ray, Kenneth G. Davenport, Juergen Lingnau +1 more 1990-10-23
4946759 Positive radiation-sensitive mixture and radiation-sensitive recording material produced therefrom Karl-Friedrich Doessel, Juergen Lingnau 1990-08-07
4933495 Process for the production of 3-mono or 3,5 dihalogenated 4-acetoxystyrene, its polymerization, and hydrolysis Mohammad Aslam, Richard Vicari, Juergen Lingnau, Karl-Friedrich Doessel 1990-06-12
4927956 3,5-disubstituted-4-acetoxystyrene and process for its production Richard Vicari, Mohammad Aslam, Wilson B. Ray, Kenneth G. Davenport, Juergen Lingnau +1 more 1990-05-22