Issued Patents All Time
Showing 26–50 of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6723488 | Photoresist composition for deep UV radiation containing an additive | Takanori Kudo, Munirathna Padmanaban | 2004-04-20 |
| 6686429 | Polymer suitable for photoresist compositions | Raj Sakamuri | 2004-02-03 |
| 6576394 | Negative-acting chemically amplified photoresist composition | Pingyong Xu, Ping-Hung Lu | 2003-06-10 |
| 6447980 | Photoresist composition for deep UV and process thereof | M. Dalil Rahman, Munirathna Padmanaban | 2002-09-10 |
| 6372414 | Lift-off process for patterning fine metal lines | Randy D. Redd, John P. Sagan, Mark A. Spak | 2002-04-16 |
| 6365322 | Photoresist composition for deep UV radiation | Munirathna Padmanaban | 2002-04-02 |
| 6274295 | Light-absorbing antireflective layers with improved performance due to refractive index optimization | Robert A. Norwood | 2001-08-14 |
| 6114085 | Antireflective composition for a deep ultraviolet photoresist | Munirathna Padmanaban, Stanley A. Ficner, Joseph E. Oberlander, John P. Sagan | 2000-09-05 |
| 6063545 | Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture | Horst Roeschert, Juergen Fuchs, Walter Spiess, Charlotte Eckes, Georg Pawlowski | 2000-05-16 |
| 6042992 | Bottom antireflective coatings through refractive index modification by anomalous dispersion | Robert Norwood | 2000-03-28 |
| 5994430 | Antireflective coating compositions for photoresist compositions and use thereof | Shuji Ding, Ping-Hung Lu, Dinesh N. Khanna, Jianhui Shan, Dana L. Durham +1 more | 1999-11-30 |
| 5981145 | Light absorbing polymers | Shuji Ding, Dinesh N. Khanna, Ping-Hung Lu, Jianhui Shan, Dana L. Durham +2 more | 1999-11-09 |
| 5922503 | Process for obtaining a lift-off imaging profile | Mark A. Spak, Michael Deprado | 1999-07-13 |
| 5843319 | Positive-working radiation-sensitive mixture | Klaus-Juergen Przybilla, Takanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Natsumi Suehiro +4 more | 1998-12-01 |
| 5807947 | Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene | Richard Vicari, Douglas J. Gordon, William D. Hinsberg, Dennis McKean, Carlton G. Willson | 1998-09-15 |
| 5733714 | Antireflective coating for photoresist compositions | Iain McCulloch, Anthony J. Corso, Shuji Ding, Dana L. Durham, Ping-Hung Lu +2 more | 1998-03-31 |
| 5719004 | Positive photoresist composition containing a 2,4-dinitro-1-naphthol | Ping-Hung Lu, Elaine G. Kokinda, Sunit S. Dixit | 1998-02-17 |
| 5688893 | Method of using a Lewis base to control molecular weight of novolak resins | M. Dalil Rahman, Daniel P. Aubin, Dana L. Durham | 1997-11-18 |
| 5652297 | Aqueous antireflective coatings for photoresist compositions | Iain McCulloch, Dana L. Durham, Ping-Hung Lu, Ming Kang, Dinesh N. Khanna +1 more | 1997-07-29 |
| 5652317 | Antireflective coatings for photoresist compositions | Iain McCulloch, Dana L. Durham, Ping-Hung Lu | 1997-07-29 |
| 5614349 | Using a Lewis base to control molecular weight of novolak resins | M. Dalil Rahman, Daniel P. Aubin, Dana L. Durham | 1997-03-25 |
| 5614351 | Radiation-curable mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation | Juergen Lingnau, Georg Pawlowski, Juergen Theis | 1997-03-25 |
| 5541036 | Negative photoresist compositions comprising a photosensitive compound, an alkoxymethylated melamine and novolak resin | Akihiko Igawa, Masato Nishikawa, Georg Pawlowski | 1996-07-30 |
| 5525453 | Positive-working radiation-sensitive mixture | Klaus-Juergen Przybilla, Takanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Natumi Suehiro +4 more | 1996-06-11 |
| 5510420 | Matarix resin for high-temperature stable photoimageable compositions | Owen B. Evans | 1996-04-23 |