Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11079411 | Electromechanical component, electromechanical component arrangement, method of detecting a potential difference by using an electromechanical component, and method for performing a functional test on the electromechanical component | Linus Elsäber, Matthias Schulze, Martin Friedrichs, Detlef Kunze | 2021-08-03 |
| 8227177 | Method for multiple irradiation of a resist | Kang-Hoon Choi, Klaus Elian, Johannes Kretz, Frank Thrum | 2012-07-24 |
| 7405028 | Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography | — | 2008-07-29 |
| 7169531 | Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives | Ralph R. Dammel, Michael Francis Houlihan | 2007-01-30 |
| 7052820 | Silicon-containing resist for photolithography | Jörg Rottstegge, Eberhard Kuhn, Waltraud Herbst, Christian Eschbaumer, Michael Sebald | 2006-05-30 |
| 7045273 | Process for silylating photoresists in the UV range | Jens FERBITZ, Werner Mormann, Jens Rottstegge, Christian Eschbaumer, Michael Sebald | 2006-05-16 |
| 7041426 | Photoresist based on polycondensates and having an increased resolution for use in 157 nanometer lithography | Christian Eschbaumer, Michael Sebald, Jörg Rottstegge | 2006-05-09 |
| 7033740 | Photoresists with reaction anchors for chemical consolidation of resist structures for exposures at 157 nm | Jörg Rottstegge, Christian Eschbaumer, Waltraud Herbst | 2006-04-25 |
| 6974655 | Silicon resist for photolithography at short exposure wavelengths and process for making photoresists | Jörg Rottstegge, Christian Eschbaumer, Michael Sebald, Wolf-Dieter Domke | 2005-12-13 |
| 6893972 | Process for sidewall amplification of resist structures and for the production of structures having reduced structure size | Jörg Rottstegge, Eberhard Kuhn, Waltraud Herbst, Christian Eschbaumer, Gertrud Falk +1 more | 2005-05-17 |
| 6806027 | CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTITUENTS USING TRANSPARENCY ENHANCEMENT OF RESIST COPOLYMERS FOR 157 NM PHOTOLITHOGRAPHY THROUGH THE USE OF FLUORINATED CINNAMIC ACID DERIVATIVES | Jörg Rottstegge, Christian Eschbaumer, Michael Sebald | 2004-10-19 |
| 6770423 | Negative resist process with simultaneous development and silylation | Jörg Rottstegge, Eberhard Kuhn, Waltraud Herbst, Christian Eschbaumer, Gertrud Falk +1 more | 2004-08-03 |
| 6759184 | Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers | Jörg Rottstegge, Christian Eschbaumer, Waltraud Herbst, Michael Sebald | 2004-07-06 |