Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7125640 | Resist for photolithography having reactive groups for subsequent modification of the resist structures | Michael Sebald | 2006-10-24 |
| 7067234 | Chemical consolidation of photoresists in the UV range | — | 2006-06-27 |
| 7052820 | Silicon-containing resist for photolithography | Eberhard Kuhn, Waltraud Herbst, Christian Eschbaumer, Christoph Hohle, Michael Sebald | 2006-05-30 |
| 7045274 | Process for structuring a photoresist by UV at less than 160 NM and then aromatic and/or alicyclic amplification | — | 2006-05-16 |
| 7041426 | Photoresist based on polycondensates and having an increased resolution for use in 157 nanometer lithography | Christian Eschbaumer, Christoph Hohle, Michael Sebald | 2006-05-09 |
| 7033740 | Photoresists with reaction anchors for chemical consolidation of resist structures for exposures at 157 nm | Christian Eschbaumer, Christoph Hohle, Waltraud Herbst | 2006-04-25 |
| 7018784 | Process for increasing the etch resistance and for reducing the hole and trench width of a photoresist structure using solvent systems of low polarity | Waltraud Herbst, Gertrud Falk, Eberhard Kuhn | 2006-03-28 |
| 6998215 | Negative resist process with simultaneous development and chemical consolidation of resist structures | — | 2006-02-14 |
| 6974655 | Silicon resist for photolithography at short exposure wavelengths and process for making photoresists | Christoph Hohle, Christian Eschbaumer, Michael Sebald, Wolf-Dieter Domke | 2005-12-13 |
| 6946236 | Negative resist process with simultaneous development and aromatization of resist structures | Eberhard Kuhn, Christian Eschbaumer, Gertrud Falk, Michael Sebald | 2005-09-20 |
| 6899997 | Process for modifying resist structures and resist films from the aqueous phase | Siew Siew Yip, Ernst-Christian Richter, Gertrud Falk, Michael Sebald, Kerstin Seibold +1 more | 2005-05-31 |
| 6893972 | Process for sidewall amplification of resist structures and for the production of structures having reduced structure size | Eberhard Kuhn, Waltraud Herbst, Christian Eschbaumer, Christoph Hohle, Gertrud Falk +1 more | 2005-05-17 |
| 6835528 | Fluorine-containing photoresist having reactive anchors for chemical amplification and improved copolymerization properties | — | 2004-12-28 |
| 6806027 | CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTITUENTS USING TRANSPARENCY ENHANCEMENT OF RESIST COPOLYMERS FOR 157 NM PHOTOLITHOGRAPHY THROUGH THE USE OF FLUORINATED CINNAMIC ACID DERIVATIVES | Christoph Hohle, Christian Eschbaumer, Michael Sebald | 2004-10-19 |
| 6770423 | Negative resist process with simultaneous development and silylation | Eberhard Kuhn, Waltraud Herbst, Christian Eschbaumer, Christoph Hohle, Gertrud Falk +1 more | 2004-08-03 |
| 6759184 | Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers | Christian Eschbaumer, Christoph Hohle, Waltraud Herbst, Michael Sebald | 2004-07-06 |