Issued Patents All Time
Showing 1–25 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7928011 | Method for structuring a substrate using a metal mask layer formed using a galvanization process | Klaus Elian | 2011-04-19 |
| 7220531 | Resist for electron beam lithography and a process for producing photomasks using electron beam lithography | Klaus Elian | 2007-05-22 |
| 7157189 | Lithographic process for reducing the lateral chromium structure loss in photomask production using chemically amplified resists | Klaus Elian | 2007-01-02 |
| 7125640 | Resist for photolithography having reactive groups for subsequent modification of the resist structures | Jörg Rottstegge | 2006-10-24 |
| 7078709 | Apparatus and method for proof of outgassing products | Waltraud Herbst, Karl Kragler | 2006-07-18 |
| 7052820 | Silicon-containing resist for photolithography | Jörg Rottstegge, Eberhard Kuhn, Waltraud Herbst, Christian Eschbaumer, Christoph Hohle | 2006-05-30 |
| 7045273 | Process for silylating photoresists in the UV range | Jens FERBITZ, Werner Mormann, Jens Rottstegge, Christoph Hohle, Christian Eschbaumer | 2006-05-16 |
| 7041426 | Photoresist based on polycondensates and having an increased resolution for use in 157 nanometer lithography | Christian Eschbaumer, Christoph Hohle, Jörg Rottstegge | 2006-05-09 |
| 7018748 | Process for producing hard masks | Ernst-Christian Richter | 2006-03-28 |
| 6974655 | Silicon resist for photolithography at short exposure wavelengths and process for making photoresists | Jörg Rottstegge, Christoph Hohle, Christian Eschbaumer, Wolf-Dieter Domke | 2005-12-13 |
| 6946236 | Negative resist process with simultaneous development and aromatization of resist structures | Jörg Rottstegge, Eberhard Kuhn, Christian Eschbaumer, Gertrud Falk | 2005-09-20 |
| 6899997 | Process for modifying resist structures and resist films from the aqueous phase | Siew Siew Yip, Jörg Rottstegge, Ernst-Christian Richter, Gertrud Falk, Kerstin Seibold +1 more | 2005-05-31 |
| 6893972 | Process for sidewall amplification of resist structures and for the production of structures having reduced structure size | Jörg Rottstegge, Eberhard Kuhn, Waltraud Herbst, Christian Eschbaumer, Christoph Hohle +1 more | 2005-05-17 |
| 6887653 | Method for structuring a photoresist layer | Ernst-Christian Richter | 2005-05-03 |
| 6841332 | Photoresist compound and method for structuring a photoresist layer | Gertrud Falk, Eberhard Kuehn, Ernst-Christian Richter | 2005-01-11 |
| 6806027 | CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTITUENTS USING TRANSPARENCY ENHANCEMENT OF RESIST COPOLYMERS FOR 157 NM PHOTOLITHOGRAPHY THROUGH THE USE OF FLUORINATED CINNAMIC ACID DERIVATIVES | Christoph Hohle, Jörg Rottstegge, Christian Eschbaumer | 2004-10-19 |
| 6800407 | Method for experimentally verifying imaging errors in photomasks | Gunther Czech, Ernst-Christian Richter, Ulrich Scheler | 2004-10-05 |
| 6770423 | Negative resist process with simultaneous development and silylation | Jörg Rottstegge, Eberhard Kuhn, Waltraud Herbst, Christian Eschbaumer, Christoph Hohle +1 more | 2004-08-03 |
| 6759184 | Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers | Jörg Rottstegge, Christian Eschbaumer, Christoph Hohle, Waltraud Herbst | 2004-07-06 |
| 6746821 | Method of structuring a photoresist layer | Ernst-Christian Richter | 2004-06-08 |
| 6746827 | Process for structuring a photoresist layer | Ernst-Christian Richter | 2004-06-08 |
| 6746828 | Process for structuring a photoresist layer | Ernst-Christian Richter | 2004-06-08 |
| 6743572 | Method for structuring a photoresist layer | Ernst-Christian Richter | 2004-06-01 |
| 6740475 | Method for structuring a photoresist layer | Ernst-Christian Richter | 2004-05-25 |
| 6703190 | Method for producing resist structures | Klaus Elian, Stefan Hien, Ernst-Christian Richter | 2004-03-09 |