Issued Patents All Time
Showing 26–48 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6696208 | Method for experimentally verifying imaging errors in optical exposure units | Gunther Czech, Ernst-Christian Richter, Ulrich Scheler | 2004-02-24 |
| 6514663 | Bottom resist | Stefan Hien | 2003-02-04 |
| 6306990 | Film-forming polymers | Stefan Hien | 2001-10-23 |
| 6110637 | Photoresists which are suitable for producing sub-micron size structures | Recai Sezi, Rainer Leuschner, Horst Borndoerfer, Siegfried Birkle, Hellmut Ahne | 2000-08-29 |
| 6063543 | Radiation-sensitive mixture and its use | Stefan Hien | 2000-05-16 |
| 5733706 | Dry-developable positive resist | Recai Sezi, Rainer Leuschner, Horst Borndorfer, Eva Rissel, Hellmut Ahne +2 more | 1998-03-31 |
| 5726094 | Process for producing a diffusion region adjacent to a recess in a substrate | Udo Schwalke, Ulrich Scheler | 1998-03-10 |
| 5703186 | Mixed polymers | Recai Sezi, Horst Borndoerfer, Hellmut Ahne, Siegfried Birkle, Eberhard Kuehn +2 more | 1997-12-30 |
| 5648195 | Radiation-sensitive resist composition comprising a diazoketone | Siegfried Birkle, Karin Preissner, Hans Jurgen Bestmann | 1997-07-15 |
| 5616667 | Copolymers | Recai Sezi, Horst Borndoerfer, Hellmut Ahne, Siegfried Birkle, Eberhard Kuehn +2 more | 1997-04-01 |
| 5512334 | Method for the production of a bottom resist | Rainer Leuschner, Recai Sezi | 1996-04-30 |
| 5384220 | Production of photolithographic structures | Recai Sezi, Horst Borndoerfer, Rainer Leuschner, Siegfried Birkle, Hellmut Ahne | 1995-01-24 |
| 5368901 | Method for the production of a bottom resist | Rainer Leuschner, Recai Sezi | 1994-11-29 |
| 5360693 | Positive o-quinone diazide photoresist containing base copolymer utilizing monomer having anhydride function and further monomer that increases etch resistance | Recai Sezi, Rainer Leuschner, Seigfried Birkle, Hellmut Ahhe | 1994-11-01 |
| 5275920 | Method of dry development utilizing quinone diazide and basic polymer resist with latent image intensification through treatment with silicon-organic compound in water | Recai Sezi, Rainer Leuschner, Siegfried Birkle, Hellmut Ahne | 1994-01-04 |
| 5262283 | Method for producing a resist structure | Recai Sezi, Horst Borndorfer, Eva Rissel, Rainer Leuschner, Hellmut Ahne +1 more | 1993-11-16 |
| 5250375 | Photostructuring process | Juergen Beck, Rainer Leuschner, Recai Sezi, Siegfried Birkle, Hellmut Ahne +1 more | 1993-10-05 |
| 5234793 | Method for dimensionally accurate structure transfer in bilayer technique wherein a treating step with a bulging agent is employed after development | Recai Sezi, Rainer Leuschner, Siegfried Birkle, Hellmut Ahne | 1993-08-10 |
| 5234794 | Photostructuring method | Rainer Leuschner, Recai Sezi, Siegfried Birkle, Hellmut Ahne | 1993-08-10 |
| 5229258 | Method for producing a resist structure | Recai Sezi, Horst Borndorfer, Eva Rissel, Rainer Leuschner, Hellmut Ahne +1 more | 1993-07-20 |
| 5194629 | Process for producing N-tertiary butoxycarbonyl-maleinimide | Eberhard Kuehn, Juergen Beck, Hellmut Ahne, Siegfried Birkle, Rainer Leuschner +2 more | 1993-03-16 |
| 5173393 | Etch-resistant deep ultraviolet resist process having an aromatic treating step after development | Recai Sezi, Rainer Leuschner, Siegfried Birkle, Hellmut Ahne | 1992-12-22 |
| 5171656 | Photosensitive composition | Juergen Beck, Rainer Leuschner, Recai Sezi, Hans Jurgen Bestmann | 1992-12-15 |