Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7018748 | Process for producing hard masks | Michael Sebald | 2006-03-28 |
| 6899997 | Process for modifying resist structures and resist films from the aqueous phase | Siew Siew Yip, Jörg Rottstegge, Gertrud Falk, Michael Sebald, Kerstin Seibold +1 more | 2005-05-31 |
| 6887653 | Method for structuring a photoresist layer | Michael Sebald | 2005-05-03 |
| 6841332 | Photoresist compound and method for structuring a photoresist layer | Gertrud Falk, Eberhard Kuehn, Michael Sebald | 2005-01-11 |
| 6800407 | Method for experimentally verifying imaging errors in photomasks | Gunther Czech, Ulrich Scheler, Michael Sebald | 2004-10-05 |
| 6746821 | Method of structuring a photoresist layer | Michael Sebald | 2004-06-08 |
| 6746827 | Process for structuring a photoresist layer | Michael Sebald | 2004-06-08 |
| 6746828 | Process for structuring a photoresist layer | Michael Sebald | 2004-06-08 |
| 6743572 | Method for structuring a photoresist layer | Michael Sebald | 2004-06-01 |
| 6740475 | Method for structuring a photoresist layer | Michael Sebald | 2004-05-25 |
| 6703190 | Method for producing resist structures | Klaus Elian, Stefan Hien, Michael Sebald | 2004-03-09 |
| 6696208 | Method for experimentally verifying imaging errors in optical exposure units | Gunther Czech, Ulrich Scheler, Michael Sebald | 2004-02-24 |