Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6899997 | Process for modifying resist structures and resist films from the aqueous phase | Siew Siew Yip, Jörg Rottstegge, Ernst-Christian Richter, Gertrud Falk, Michael Sebald +1 more | 2005-05-31 |
| 6890699 | Polymer material having a low glass transition temperature for use in chemically amplified photoresists for semiconductor production | Oliver Kirch | 2005-05-10 |