Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7052820 | Silicon-containing resist for photolithography | Jörg Rottstegge, Eberhard Kuhn, Waltraud Herbst, Christoph Hohle, Michael Sebald | 2006-05-30 |
| 7045273 | Process for silylating photoresists in the UV range | Jens FERBITZ, Werner Mormann, Jens Rottstegge, Christoph Hohle, Michael Sebald | 2006-05-16 |
| 7041426 | Photoresist based on polycondensates and having an increased resolution for use in 157 nanometer lithography | Christoph Hohle, Michael Sebald, Jörg Rottstegge | 2006-05-09 |
| 7033740 | Photoresists with reaction anchors for chemical consolidation of resist structures for exposures at 157 nm | Jörg Rottstegge, Christoph Hohle, Waltraud Herbst | 2006-04-25 |
| 6974655 | Silicon resist for photolithography at short exposure wavelengths and process for making photoresists | Jörg Rottstegge, Christoph Hohle, Michael Sebald, Wolf-Dieter Domke | 2005-12-13 |
| 6946236 | Negative resist process with simultaneous development and aromatization of resist structures | Jörg Rottstegge, Eberhard Kuhn, Gertrud Falk, Michael Sebald | 2005-09-20 |
| 6893972 | Process for sidewall amplification of resist structures and for the production of structures having reduced structure size | Jörg Rottstegge, Eberhard Kuhn, Waltraud Herbst, Christoph Hohle, Gertrud Falk +1 more | 2005-05-17 |
| 6806027 | CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTITUENTS USING TRANSPARENCY ENHANCEMENT OF RESIST COPOLYMERS FOR 157 NM PHOTOLITHOGRAPHY THROUGH THE USE OF FLUORINATED CINNAMIC ACID DERIVATIVES | Christoph Hohle, Jörg Rottstegge, Michael Sebald | 2004-10-19 |
| 6770423 | Negative resist process with simultaneous development and silylation | Jörg Rottstegge, Eberhard Kuhn, Waltraud Herbst, Christoph Hohle, Gertrud Falk +1 more | 2004-08-03 |
| 6759184 | Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers | Jörg Rottstegge, Christoph Hohle, Waltraud Herbst, Michael Sebald | 2004-07-06 |