Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12404423 | Chemical-mechanical polishing liquid | Xiaoming Ren, Changzheng Jia | 2025-09-02 |
| 12365814 | Chemical mechanical polishing solution | Xiaoming Ren, Changzheng Jia | 2025-07-22 |
| 12264266 | Chemical mechanical polishing liquid | Xiaoming Ren, Changzheng Jia | 2025-04-01 |
| 11034862 | Polishing composition and method utilizing abrasive particles treated with an aminosilane | Steven Grumbine, William Ward, Pankaj Kumar Singh, Jeffrey Dysard | 2021-06-15 |
| 10508219 | Polishing composition and method utilizing abrasive particles treated with an aminosilane | Steven Grumbine, William Ward, Pankaj Kumar Singh, Jeffrey Dysard | 2019-12-17 |
| 9951054 | CMP porous pad with particles in a polymeric matrix | Robert Vacassy, Jaishankar Kasthuri | 2018-04-24 |
| 9617450 | Polishing composition and method utilizing abrasive particles treated with an aminosilane | Steven Grumbine, William Ward, Pankaj Kumar Singh, Jeffrey Dysard | 2017-04-11 |
| 9028572 | Polishing composition and method utilizing abrasive particles treated with an aminosilane | Steven Grumbine, William Ward, Pankaj Kumar Singh, Jeffrey Dysard | 2015-05-12 |
| 8637404 | Metal cations for initiating polishing | Phillip W. Carter | 2014-01-28 |
| 8591763 | Halide anions for metal removal rate control | — | 2013-11-26 |
| 8551202 | Iodate-containing chemical-mechanical polishing compositions and methods | Phillip W. Carter, Jian Zhang | 2013-10-08 |
| 8529680 | Compositions for CMP of semiconductor materials | Francesco De Rege Thesauro, Steven Grumbine, Phillip W. Carter, Jian Zhang, David Schroeder +1 more | 2013-09-10 |
| 8252687 | Barrier slurry for low-k dielectrics | Steven Grumbine, Jeffrey Dysard, Pankaj Kumar Singh | 2012-08-28 |
| 7998228 | Tantalum CMP compositions and methods | — | 2011-08-16 |
| 7820067 | Halide anions for metal removal rate control | — | 2010-10-26 |
| 7803203 | Compositions and methods for CMP of semiconductor materials | Francesco De Rege Thesauro, Steven Grumbine, Phillip W. Carter, Jian Zhang, David Schroeder +1 more | 2010-09-28 |
| 6255261 | (Meth) acrylate copolymer pour point depressants | Gregory P. Liesen, Tze-Chi Jao | 2001-07-03 |