Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8529680 | Compositions for CMP of semiconductor materials | Francesco De Rege Thesauro, Steven Grumbine, Phillip W. Carter, Shoutian Li, Jian Zhang +1 more | 2013-09-10 |
| 7803203 | Compositions and methods for CMP of semiconductor materials | Francesco De Rege Thesauro, Steven Grumbine, Phillip W. Carter, Shoutian Li, Jian Zhang +1 more | 2010-09-28 |
| 7754098 | Chemical-mechanical polishing composition and method for using the same | Kevin Moeggenborg | 2010-07-13 |
| 7485241 | Chemical-mechanical polishing composition and method for using the same | Kevin Moeggenborg | 2009-02-03 |
| 7365013 | System for the preferential removal of silicon oxide | Brian L. Mueller, Jeffery P. Chamberlain | 2008-04-29 |
| 7238618 | System for the preferential removal of silicon oxide | Brian L. Mueller, Jeffery P. Chamberlain | 2007-07-03 |
| 7091604 | Three dimensional integrated circuits | Ian Wylie, Heinz H. Busta, J. Scott Steckenrider, Yuchun Wang | 2006-08-15 |
| 6936543 | CMP method utilizing amphiphilic nonionic surfactants | Kevin Moeggenborg, Homer Chou, Jeffrey P. Chamberlain, Joseph Hawkins, Phillip W. Carter | 2005-08-30 |
| 6821897 | Method for copper CMP using polymeric complexing agents | Phillip W. Carter, Jeffrey P. Chamberlain, Kyle Miller, Isaac K. Cherian | 2004-11-23 |
| 6726534 | Preequilibrium polishing method and system | Gregory Bogush, Jeffrey P. Chamberlain, Paul M. Feeney, Brian L. Mueller, Alicia Walters | 2004-04-27 |
| 6612911 | Alkali metal-containing polishing system and method | Phillip W. Carter, Gregory Bogush, Francesco M. De Rege, Jeffrey P. Chamberlain, Brian L. Mueller | 2003-09-02 |