Issued Patents All Time
Showing 25 most recent of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10002760 | Method for manufacturing SiC wafer fit for integration with power device manufacturing technology | Darren Hansen, Mark Loboda, Ian Manning, Stephan Mueller, Christopher Parfeniuk +3 more | 2018-06-19 |
| 9303187 | Compositions and methods for CMP of silicon oxide, silicon nitride, and polysilicon materials | Dimitry Dinega, William Ward, Daniel Mateja | 2016-04-05 |
| 9279192 | Method for manufacturing SiC wafer fit for integration with power device manufacturing technology | Darren Hansen, Mark Loboda, Ian Manning, Stephan Mueller, Christopher Parfeniuk +3 more | 2016-03-08 |
| 8691695 | CMP compositions and methods for suppressing polysilicon removal rates | William Ward, Ming-Shih Tsai, Francesco De Rege Thesauro | 2014-04-08 |
| 8597538 | Composition for improving dryness during wire sawing | Nevin Naguib Sant, Steven Grumbine | 2013-12-03 |
| 8251777 | Polishing slurry for aluminum and aluminum alloys | John Clark, Jeffrey Gilliland, Stanley Lesiak, Susan Wilson, Vlasta Brusic | 2012-08-28 |
| 8101093 | Chemical-mechanical polishing composition and method for using the same | Francesco De Rege Thesauro, Vlasta Brusic, Benjamin Bayer | 2012-01-24 |
| 7998866 | Silicon carbide polishing method utilizing water-soluble oxidizers | Michael White, Lamon Jones, Jeffrey Gilliland | 2011-08-16 |
| 7754098 | Chemical-mechanical polishing composition and method for using the same | David Schroeder | 2010-07-13 |
| 7678700 | Silicon carbide polishing method utilizing water-soluble oxidizers | Mukesh Desai, Phillip W. Carter | 2010-03-16 |
| 7485241 | Chemical-mechanical polishing composition and method for using the same | David Schroeder | 2009-02-03 |
| 7306637 | Anionic abrasive particles treated with positively charged polyelectrolytes for CMP | Isaac K. Cherian, Phillip W. Carter, Jeffrey P. Chamberlain, David W. Boldridge | 2007-12-11 |
| 7255810 | Polishing system comprising a highly branched polymer | Fred Sun | 2007-08-14 |
| 7004819 | CMP systems and methods utilizing amine-containing polymers | Isaac K. Cherian, Vlasta Brusic | 2006-02-28 |
| 6974777 | CMP compositions for low-k dielectric materials | Homer Chou, Joseph Hawkins, Jeffrey P. Chamberlain | 2005-12-13 |
| 6936543 | CMP method utilizing amphiphilic nonionic surfactants | David Schroeder, Homer Chou, Jeffrey P. Chamberlain, Joseph Hawkins, Phillip W. Carter | 2005-08-30 |
| 6841479 | Method of reducing in-trench smearing during polishing | Isaac K. Cherian, Paul M. Feeney | 2005-01-11 |
| 6776810 | Anionic abrasive particles treated with positively charged polyelectrolytes for CMP | Isaac K. Cherian, Phillip W. Carter, Jeffrey P. Chamberlain, David W. Boldridge | 2004-08-17 |
| 6589100 | Rare earth salt/oxidizer-based CMP method | Vlasta Brusic Kaufman, Isaac K. Cherian | 2003-07-08 |
| 6527622 | CMP method for noble metals | Vlasta Brusic, Francesco M. De Rege, Isaac K. Cherian, Renjie Zhou | 2003-03-04 |
| 6153106 | Method for inhibiting the formation and deposition of silica scale in water systems | Douglas G. Kelley, David P. Workman | 2000-11-28 |
| 6075082 | Cross-linked polymide binders for ceramics manufacture | David P. Workman, Kristy M. Bailey | 2000-06-13 |
| 6060318 | Tracing of process additives in industrial ceramics applications | James E. Whitten, Joseph C. Alfano | 2000-05-09 |
| 6005040 | Preparation and utility of water-soluble polymers having pendant derivatized amide, ester or ether functionalities as ceramics dispersants and binders | Christopher P. Howland, John D. Morris, Peter E. Reed, Jiansheng Tang, Jin-Shan Wang | 1999-12-21 |
| 5922801 | Polyamide binders for ceramics manufacture | Kristy M. Bailey, Christopher P. Howland | 1999-07-13 |