| 10002760 |
Method for manufacturing SiC wafer fit for integration with power device manufacturing technology |
Darren Hansen, Mark Loboda, Ian Manning, Stephan Mueller, Christopher Parfeniuk +3 more |
2018-06-19 |
|
| 9303187 |
Compositions and methods for CMP of silicon oxide, silicon nitride, and polysilicon materials |
Dimitry Dinega, William Ward, Daniel Mateja |
2016-04-05 |
$4,332,000 |
| 9279192 |
Method for manufacturing SiC wafer fit for integration with power device manufacturing technology |
Darren Hansen, Mark Loboda, Ian Manning, Stephan Mueller, Christopher Parfeniuk +3 more |
2016-03-08 |
$39,098,000 |
| 8691695 |
CMP compositions and methods for suppressing polysilicon removal rates |
William Ward, Ming-Shih Tsai, Francesco De Rege Thesauro |
2014-04-08 |
$16,239,000 |
| 8597538 |
Composition for improving dryness during wire sawing |
Nevin Naguib Sant, Steven Grumbine |
2013-12-03 |
$5,487,000 |
| 8251777 |
Polishing slurry for aluminum and aluminum alloys |
John Clark, Jeffrey Gilliland, Stanley Lesiak, Susan Wilson, Vlasta Brusic |
2012-08-28 |
$4,727,000 |
| 8101093 |
Chemical-mechanical polishing composition and method for using the same |
Francesco De Rege Thesauro, Vlasta Brusic, Benjamin Bayer |
2012-01-24 |
$7,411,000 |
| 7998866 |
Silicon carbide polishing method utilizing water-soluble oxidizers |
Michael White, Lamon Jones, Jeffrey Gilliland |
2011-08-16 |
$2,469,000 |
| 7754098 |
Chemical-mechanical polishing composition and method for using the same |
David Schroeder |
2010-07-13 |
$12,424,000 |
| 7678700 |
Silicon carbide polishing method utilizing water-soluble oxidizers |
Mukesh Desai, Phillip W. Carter |
2010-03-16 |
$6,761,000 |
| 7485241 |
Chemical-mechanical polishing composition and method for using the same |
David Schroeder |
2009-02-03 |
$2,507,000 |
| 7306637 |
Anionic abrasive particles treated with positively charged polyelectrolytes for CMP |
Isaac K. Cherian, Phillip W. Carter, Jeffrey P. Chamberlain, David W. Boldridge |
2007-12-11 |
$15,588,000 |
| 7255810 |
Polishing system comprising a highly branched polymer |
Fred Sun |
2007-08-14 |
$8,383,000 |
| 7004819 |
CMP systems and methods utilizing amine-containing polymers |
Isaac K. Cherian, Vlasta Brusic |
2006-02-28 |
$3,864,000 |
| 6974777 |
CMP compositions for low-k dielectric materials |
Homer Chou, Joseph Hawkins, Jeffrey P. Chamberlain |
2005-12-13 |
$9,847,000 |
| 6936543 |
CMP method utilizing amphiphilic nonionic surfactants |
David Schroeder, Homer Chou, Jeffrey P. Chamberlain, Joseph Hawkins, Phillip W. Carter |
2005-08-30 |
$3,600,000 |
| 6841479 |
Method of reducing in-trench smearing during polishing |
Isaac K. Cherian, Paul M. Feeney |
2005-01-11 |
$3,223,000 |
| 6776810 |
Anionic abrasive particles treated with positively charged polyelectrolytes for CMP |
Isaac K. Cherian, Phillip W. Carter, Jeffrey P. Chamberlain, David W. Boldridge |
2004-08-17 |
$11,583,000 |
| 6589100 |
Rare earth salt/oxidizer-based CMP method |
Vlasta Brusic Kaufman, Isaac K. Cherian |
2003-07-08 |
$9,813,000 |
| 6527622 |
CMP method for noble metals |
Vlasta Brusic, Francesco M. De Rege, Isaac K. Cherian, Renjie Zhou |
2003-03-04 |
$3,631,000 |
| 6153106 |
Method for inhibiting the formation and deposition of silica scale in water systems |
Douglas G. Kelley, David P. Workman |
2000-11-28 |
|
| 6075082 |
Cross-linked polymide binders for ceramics manufacture |
David P. Workman, Kristy M. Bailey |
2000-06-13 |
|
| 6060318 |
Tracing of process additives in industrial ceramics applications |
James E. Whitten, Joseph C. Alfano |
2000-05-09 |
|
| 6005040 |
Preparation and utility of water-soluble polymers having pendant derivatized amide, ester or ether functionalities as ceramics dispersants and binders |
Christopher P. Howland, John D. Morris, Peter E. Reed, Jiansheng Tang, Jin-Shan Wang |
1999-12-21 |
|
| 5922801 |
Polyamide binders for ceramics manufacture |
Kristy M. Bailey, Christopher P. Howland |
1999-07-13 |
$11,283,000 |
