Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7306637 | Anionic abrasive particles treated with positively charged polyelectrolytes for CMP | Isaac K. Cherian, Phillip W. Carter, Kevin Moeggenborg, David W. Boldridge | 2007-12-11 |
| 6974777 | CMP compositions for low-k dielectric materials | Kevin Moeggenborg, Homer Chou, Joseph Hawkins | 2005-12-13 |
| 6936543 | CMP method utilizing amphiphilic nonionic surfactants | David Schroeder, Kevin Moeggenborg, Homer Chou, Joseph Hawkins, Phillip W. Carter | 2005-08-30 |
| 6821897 | Method for copper CMP using polymeric complexing agents | David Schroeder, Phillip W. Carter, Kyle Miller, Isaac K. Cherian | 2004-11-23 |
| 6776810 | Anionic abrasive particles treated with positively charged polyelectrolytes for CMP | Isaac K. Cherian, Phillip W. Carter, Kevin Moeggenborg, David W. Boldridge | 2004-08-17 |
| 6726534 | Preequilibrium polishing method and system | Gregory Bogush, Paul M. Feeney, Brian L. Mueller, David Schroeder, Alicia Walters | 2004-04-27 |
| 6612911 | Alkali metal-containing polishing system and method | Phillip W. Carter, Gregory Bogush, Francesco M. De Rege, David Schroeder, Brian L. Mueller | 2003-09-02 |
| 6431953 | CMP process involving frequency analysis-based monitoring | Phillip W. Carter | 2002-08-13 |
| 6053032 | System and method for determining a deposition rate in a process stream indicative of a mass build-up and for controlling feed of a product in the process stream to combat same | Paul R. Kraus, Linda R. Robertson, Barbara E. Moriarty | 2000-04-25 |