Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Jeffrey P. Chamberlain — 9 Patents

CMCabot Microelectronics: 8 patents #30 of 207Top 15%
NCNalco Chemical: 1 patents #591 of 636Top 95%
Wheaton, IL: #116 of 884 inventorsTop 15%
Illinois: #10,163 of 84,256 inventorsTop 15%
Overall (All Time): #535,341 of 4,157,543Top 15%
9 Patents All Time
Jeffrey P. Chamberlain has been granted 9 US patents while listed as an inventor at Cabot Microelectronics. The first was granted in 2000 and the most recent in December 2007. Jeffrey P. Chamberlain ranks #535,341 of 4,157,543 US inventors in our database (top 12.9%). Patent records list Jeffrey P. Chamberlain in Wheaton, IL, US.

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
7306637 Anionic abrasive particles treated with positively charged polyelectrolytes for CMP Isaac K. Cherian, Phillip W. Carter, Kevin Moeggenborg, David W. Boldridge 2007-12-11 $15,588,000
6974777 CMP compositions for low-k dielectric materials Kevin Moeggenborg, Homer Chou, Joseph Hawkins 2005-12-13 $9,847,000
6936543 CMP method utilizing amphiphilic nonionic surfactants David Schroeder, Kevin Moeggenborg, Homer Chou, Joseph Hawkins, Phillip W. Carter 2005-08-30 $3,600,000
6821897 Method for copper CMP using polymeric complexing agents David Schroeder, Phillip W. Carter, Kyle Miller, Isaac K. Cherian 2004-11-23 $6,754,000
6776810 Anionic abrasive particles treated with positively charged polyelectrolytes for CMP Isaac K. Cherian, Phillip W. Carter, Kevin Moeggenborg, David W. Boldridge 2004-08-17 $11,583,000
6726534 Preequilibrium polishing method and system Gregory Bogush, Paul M. Feeney, Brian L. Mueller, David Schroeder, Alicia Walters 2004-04-27 $10,470,000
6612911 Alkali metal-containing polishing system and method Phillip W. Carter, Gregory Bogush, Francesco M. De Rege, David Schroeder, Brian L. Mueller 2003-09-02 $9,502,000
6431953 CMP process involving frequency analysis-based monitoring Phillip W. Carter 2002-08-13 $4,595,000
6053032 System and method for determining a deposition rate in a process stream indicative of a mass build-up and for controlling feed of a product in the process stream to combat same Paul R. Kraus, Linda R. Robertson, Barbara E. Moriarty 2000-04-25